Transistor contacts and methods of forming the same
US-2024395871-A1 · Nov 28, 2024 · US
US8975690B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8975690-B2 |
| Application number | US-201313970047-A |
| Country | US |
| Kind code | B2 |
| Filing date | Aug 19, 2013 |
| Priority date | Sep 19, 2012 |
| Publication date | Mar 10, 2015 |
| Grant date | Mar 10, 2015 |
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According to one embodiment, a semiconductor device includes a first semiconductor region of a first conductivity type, a second semiconductor region of the first conductivity type, a third semiconductor region of a second conductivity type, a fourth semiconductor region of the first conductivity type, a fifth semiconductor region of the second conductivity type, a first electrode, a second electrode, and a third electrode. The first electrode is provided together with the first region in a first direction, provided together with the third region in a second direction, and has an end portion of the first region side located nearer to the first semiconductor side than a boundary between the second region and the third region. The second electrode is provided between the first electrode and the first region and is in electrical continuity with the fourth region. The third electrode contacts with the fourth region.
Opening claim text (preview).
What is claimed is: 1. A semiconductor device comprising: a first semiconductor region of a first conductivity type; a second semiconductor region of the first conductivity type provided contact with the first semiconductor region and having an impurity concentration higher than an impurity concentration of the first semiconductor region; a third semiconductor region of a second conductivity type provided on a side opposite to the first semiconductor region of the second semic…
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
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