Composition for forming silica based layer, and method for manufacturing silica based layer
US-2015337168-A1 · Nov 26, 2015 · US
High refractive index polymers
US8975356B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8975356-B2 |
| Application number | US-201313918232-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jun 14, 2013 |
| Priority date | Aug 28, 2009 |
| Publication date | Mar 10, 2015 |
| Grant date | Mar 10, 2015 |
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Abstract
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A polymer and a method of forming a polymer are provided. The polymer has the general structure (I): wherein M is a main group element, a transition metal element, or an organic moiety; X is a main group element selected from S, P, As, Se, Te, and Sb; R 1 is a direct bond between M and the ethylene group depicted between M and X or a hydrocarbyl linking moiety having between 1 and about 9 carbon atoms; R 2 is a hydrocarbyl moiety; R 3 is an organic linking group; Y has a value of 0, 1, 2, 3, or 4; Z has a value of 0, 1, 2, 3, or 4; YY has a value of 0, 1 or 2; and Y, YY, and Z are such that the total number of moieties bonded to M is 3, 4, 5, or 6.
First claim
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What is claimed is: 1. A composition prepared by a bulk polymerization method comprising forming a mixture consisting essentially of a first multifunctional monomer comprising alkenyl groups and a second multifunctional monomer comprising moieties that are reactive with alkenyl groups, reacting said first multifunctional monomer with said second multifunctional monomer to form a partially cross-linked prepolymer gel and thereafter curing the prepolymer to form a bulk polymer having…
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- What does patent US8975356B2 cover?
- A polymer and a method of forming a polymer are provided. The polymer has the general structure (I): wherein M is a main group element, a transition metal element, or an organic moiety; X is a main group element selected from S, P, As, Se, Te, and Sb; R 1 is a direct bond between M and the ethylene group depicted between M and X or a hydrocarbyl linking moiety having…
- Who is the assignee on this patent?
- Univ Florida State Res Found
- What technology area does this patent fall under?
- Primary CPC classification C08G77/60. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Mar 10 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).