Resist composition and pattern forming process
US-2024377730-A1 · Nov 14, 2024 · US
Method of forming polymer nanofiber metal-nanoparticle composite pattern
US8975007B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8975007-B2 |
| Application number | US-201414274832-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 12, 2014 |
| Priority date | May 10, 2013 |
| Publication date | Mar 10, 2015 |
| Grant date | Mar 10, 2015 |
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Abstract
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A method of forming a polymer nanofiber-metal nanoparticle composite pattern includes forming on a substrate a polymer nanofiber layer comprising polymer nanofibers made from polymers including a heteroaryl group; selectively exposing to UV-ozone a part of the polymer nanofiber layer through an aperture of a mask; selectively removing a part of the polymer nanofiber layer which was not exposed to UV-ozone from the polymer nanofiber layer to form a polymer nanofiber layer pattern; depositing a metal precursor on the polymer nanofiber layer pattern; and reducing the metal precursor into a metal.
First claim
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What is claimed is: 1. A method of forming a polymer nanofiber-metal nanoparticle composite pattern, the method comprising: forming on a substrate a polymer nanofiber layer comprising polymer nanofibers made from polymers comprising a heteroaryl group; selectively exposing to UV-ozone a part of the polymer nanofiber layer through an aperture of a mask; selectively removing a part of the polymer nanofiber layer which was not exposed to UV-ozone from the polymer nanofiber layer…
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- What does patent US8975007B2 cover?
- A method of forming a polymer nanofiber-metal nanoparticle composite pattern includes forming on a substrate a polymer nanofiber layer comprising polymer nanofibers made from polymers including a heteroaryl group; selectively exposing to UV-ozone a part of the polymer nanofiber layer through an aperture of a mask; selectively removing a part of the polymer nanofiber layer which was not exposed …
- Who is the assignee on this patent?
- Samsung Electronics Co Ltd, Univ Yonsei Iacf
- What technology area does this patent fall under?
- Primary CPC classification G03F7/20. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Mar 10 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).