Ferromagnetic amorphous alloy ribbon and fabrication thereof

US8974609B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-8974609-B2
Application numberUS-92307410-A
CountryUS
Kind codeB2
Filing dateAug 31, 2010
Priority dateAug 31, 2010
Publication dateMar 10, 2015
Grant dateMar 10, 2015

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Abstract

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A ferromagnetic amorphous alloy ribbon includes an alloy having a composition represented by Fe a Si b B c C d where 80.5≦a≦83 at. %, 0.5≦b≦6 at. %, 12≦c≦16.5 at. %, 0.01≦d≦1 at. % with a+b+c+d=100 and incidental impurities, the defect length along a direction of the ribbon's length being between 5 mm and 200 mm, the defect depth being less than 0.4×t μm and the defect occurrence frequency being less than 0.05×w times within 1.5 m of ribbon length, where t and w are ribbon thickness and ribbon width, respectively, and the ribbon in its annealed state and straight strip form of the ribbon, has a saturation magnetic induction exceeding 1.60 T, and exhibits a magnetic core loss of less than 0.14 W/kg when measured at 60 Hz and at 1.3 T induction level. The ribbon is suitable for use in transformer cores, rotational machines, electrical chokes, magnetic sensors and pulse power devices.

First claim

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What is claimed is: 1. A ferromagnetic amorphous alloy ribbon produced by a continuous casting, the ribbon comprising: an alloy having a composition represented by Fe a Si b B c C d where 80.5≦a≦83 at. %, 0.5≦b≦6 at. %, 12≦c≦16.5 at. %, 0.01≦d≦1 at. % with a+b+c+d=100 and incidental impurities, the ribbon having been cast from a molten state of the alloy, with a molten alloy surface tension of greater than or equal to 1.1 N/m, the ribbon having a ribbon length, a ribbon thick…

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What does patent US8974609B2 cover?
A ferromagnetic amorphous alloy ribbon includes an alloy having a composition represented by Fe a Si b B c C d where 80.5≦a≦83 at. %, 0.5≦b≦6 at. %, 12≦c≦16.5 at. %, 0.01≦d≦1 at. % with a+b+c+d=100 and incidental impurities, the defect length along a direction of the ribbon's length being between 5 mm and 200 mm, the defect depth being less than 0.4×t μm and the defect occurrence frequency bei…
Who is the assignee on this patent?
Ogawa Yuichi, Theisen Eric A, Matsumoto Yuji, and 4 more
What technology area does this patent fall under?
Primary CPC classification B22D11/0611. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Mar 10 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).