Process for producing glass substrate provided with aluminum oxide-containing silicon oxide film

US8973403B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-8973403-B2
Application numberUS-201213710780-A
CountryUS
Kind codeB2
Filing dateDec 11, 2012
Priority dateJun 11, 2010
Publication dateMar 10, 2015
Grant dateMar 10, 2015

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  2. Abstract

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  5. First independent claim

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Abstract

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A process for producing a glass substrate provided with an aluminum oxide-containing silicon oxide film, which comprises applying a coating liquid containing an organopolysiloxane and an organic aluminum complex to a glass substrate within a temperature range of from 400 to 650° C. to form an aluminum oxide-containing silicon oxide film on the glass substrate, and a process for producing a glass substrate comprising forming molten glass into a glass ribbon, annealing the glass ribbon and cutting it to produce a glass substrate, wherein a coating liquid containing an organopolysiloxane and an organic aluminum complex is applied to the glass ribbon at a position where the glass ribbon is within a temperature range of from 400 to 650° C. to form an aluminum oxide-containing silicon oxide film on the glass ribbon.

First claim

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What is claimed is: 1. A process for producing a glass substrate provided with an aluminum oxide-containing silicon oxide film, comprising applying a coating liquid comprising an organopolysiloxane and an organic aluminum complex to a glass substrate which is at a temperature of from 400 to 650° C. to form an aluminum oxide-containing silicon oxide film on the glass substrate, wherein the content of the organic aluminum complex to the content of the organopolysiloxane in the coatin…

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What does patent US8973403B2 cover?
A process for producing a glass substrate provided with an aluminum oxide-containing silicon oxide film, which comprises applying a coating liquid containing an organopolysiloxane and an organic aluminum complex to a glass substrate within a temperature range of from 400 to 650° C. to form an aluminum oxide-containing silicon oxide film on the glass substrate, and a process for producing a glas…
Who is the assignee on this patent?
Asahi Glass Co Ltd
What technology area does this patent fall under?
Primary CPC classification C03C17/25. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Mar 10 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).