Control method and apparatus

Patent metadata

Field	Value
Publication number	US-8972031-B2
Application number	US-201113042928-A
Country	US
Kind code	B2
Filing date	Mar 8, 2011
Priority date	Mar 19, 2010
Publication date	Mar 3, 2015
Grant date	Mar 3, 2015

Abstract

A higher-level controller can correct measured metrology data with residual error values as reported by a lower-level controller. This results in a more accurate process disturbance estimate. A method of control obtains, based on measurement sample definition, a first process variable of a system under control, determines a residual error using the first process variable and a first set point, controls the system using the residual error, obtains, based on the same sample definition, a second process variable, and adjusts the second process variable using the residual error. The method may also include determining, using the adjusted second process variable, one or more first set points for controlling the system by the low-level controller that may vary in correspondence with the sample definition.

First claim

What is claimed is:

1. A method, comprising:
obtaining, using a first controller, a first process variable based on a measurement sample definition;
determining, using the first controller, a first residual error over a wafer based on the first process variable and a first set point, wherein at least the first process variable and the first set point are input parameters of the first controller;
controlling, using the first controller, a system based on the first residual erro…

Assignees

• Mos Everhardus Cornelis
• Hepp Birgitt Noëlle Cornelia Liduine
• Menger Jasper Thijs
• Asml Netherlands Bv

Inventors

• Mos Everhardus Cornelis
• Hepp Birgitt Noëlle Cornelia Liduine
• Menger Jasper Thijs

Classifications

• G03F7/70483 Primary

  Physics · mapped topic