Quantitative analysis apparatus, method and program and manufacturing control system
US-12174131-B2 · Dec 24, 2024 · US
Analysis method for X-ray diffraction measurement data
US8971492B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8971492-B2 |
| Application number | US-201213600740-A |
| Country | US |
| Kind code | B2 |
| Filing date | Aug 31, 2012 |
| Priority date | Sep 26, 2011 |
| Publication date | Mar 3, 2015 |
| Grant date | Mar 3, 2015 |
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Abstract
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Peak positions and integrated intensities of diffraction X-ray are determined on the basis of X-ray diffraction measurement data output from an X-ray diffractometer, the number of determined peaks of the diffraction X-ray is counted, and analysis processing is started when the counted number of peaks reaches a preset peak number. The analysis processing is repetitively executed on the basis of X-ray diffraction measurement data. The peak positions and the integrated intensities of the diffraction X-ray are determined from the X-ray diffraction measurement data obtained from the start of the measurement till the analysis processing concerned, and qualitative analysis of collating the determined peak positions and integrated intensities with standard peak card data whose data base is made in advance and searching materials contained in a measurement sample, and quantitative analysis of determining the quantities of the materials contained in the measurement sample are executed.
First claim
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The invention claimed is: 1. An analysis method for X-ray diffraction measurement data, comprising the steps of: repetitively executing analysis of X-ray diffraction measurement data output from an X-ray diffractometer on the basis of the X-ray diffraction measurement data in parallel to X-ray diffraction measurement based on the X-ray diffractometer; determining peak positions and integrated intensities of diffraction peaks on the basis of the X-ray diffraction measurement data…
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Physics · mapped topic
Physics · mapped topic
- G01N23/207Primary
Physics · mapped topic
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- What does patent US8971492B2 cover?
- Peak positions and integrated intensities of diffraction X-ray are determined on the basis of X-ray diffraction measurement data output from an X-ray diffractometer, the number of determined peaks of the diffraction X-ray is counted, and analysis processing is started when the counted number of peaks reaches a preset peak number. The analysis processing is repetitively executed on the basis of …
- Who is the assignee on this patent?
- Sasaki Akito, Morikawa Keiichi, Himeda Akihiro, and 2 more
- What technology area does this patent fall under?
- Primary CPC classification G01N23/207. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Mar 03 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).