Target structure and target device
US-11985755-B2 · May 14, 2024 · US
US8971473B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8971473-B2 |
| Application number | US-99218809-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jun 9, 2009 |
| Priority date | Jun 10, 2008 |
| Publication date | Mar 3, 2015 |
| Grant date | Mar 3, 2015 |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
An apparatus for the generation of neutron/gamma rays is described including a chamber which defines an ion source, said apparatus including an RF antenna positioned outside of or within the chamber. Positioned within the chamber is a target material. One or more sets of confining magnets are also provided to create a cross B magnetic field directly above the target. To generate neutrons/gamma rays, the appropriate source gas is first introduced into the chamber, the RF antenna energized and a plasma formed. A series of high voltage pulses are then applied to the target. A plasma sheath, which serves as an accelerating gap, is formed upon application of the high voltage pulse to the target. Depending upon the selected combination of source gas and target material, either neutrons or gamma rays are generated, which may be used for cargo inspection, and the like.
Opening claim text (preview).
We claim: 1. An apparatus comprising: a chamber; a target positioned within the chamber comprising a material configured to generate neutrons or gamma rays when struck by ions; a gas source in fluid communication with the chamber configured to deliver a gas to the chamber; an RF antenna configured to cause a plasma to be generated at a source location in the chamber from the gas; a plurality of magnets proximate the target, the plurality of magnets configured to direct sec…
Related publications grouped by family.
Free tools are coming soon. Tell us what you want to track and we'll notify you.
Answers are generated from the same data shown on this page.