Thermo-mechanical actuator
US-12117739-B2 · Oct 15, 2024 · US
Support table for a lithographic apparatus, lithographic apparatus and device manufacturing method
US8970822B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8970822-B2 |
| Application number | US-201213586689-A |
| Country | US |
| Kind code | B2 |
| Filing date | Aug 15, 2012 |
| Priority date | Aug 17, 2011 |
| Publication date | Mar 3, 2015 |
| Grant date | Mar 3, 2015 |
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Abstract
Official abstract text for this publication.
A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.
First claim
Opening claim text (preview).
The invention claimed is: 1. A support table for a lithographic apparatus, the support table comprising: a support section, configured to support a lower surface of a substrate on an upper face thereof; a conditioning system, configured to supply heat energy to and/or remove heat energy from the support section; and a control system structured or programmed to control the conditioning system to supply the heat energy to and/or remove the heat energy from the support section;…
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Classifications
Electricity · mapped topic
Electricity · mapped topic
- G03F7/70716Primary
Physics · mapped topic
- G03F7/70875Primary
Physics · mapped topic
Physics · mapped topic
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- What does patent US8970822B2 cover?
- A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the subs…
- Who is the assignee on this patent?
- Kunnen Johan Gertrudis Cornelis, Houben Martijn, Laurent Thibault Simon Mathieu, and 4 more
- What technology area does this patent fall under?
- Primary CPC classification G03F7/70716. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Mar 03 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).