Power semiconductor device

US8969960B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-8969960-B2
Application numberUS-201214346466-A
CountryUS
Kind codeB2
Filing dateJun 7, 2012
Priority dateSep 21, 2011
Publication dateMar 3, 2015
Grant dateMar 3, 2015

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A power semiconductor device includes a second conductive type sense outer-peripheral well formed to surround a plurality of sense wells on the surface of a drift layer, a first conductive type main-cell source region selectively formed on the surface of the main cell well, a first conductive type sense source region selectively formed on the surface of the sense well, a first conductive type capacitor lower electrode region selectively formed on the surface of the sense outer-peripheral well, a gate insulation film formed on the channel regions and on the sense outer-peripheral well, a gate electrode formed on the gate insulation film, and a sense pad electrically connected to the sense well and the sense source region as well as on the sense outer-peripheral well and the capacitor lower electrode region.

First claim

Opening claim text (preview).

The invention claimed is: 1. A power semiconductor device comprising: a first conductive type drift layer formed on a first principal surface of a first conductive type silicon carbide semiconductor substrate; a plurality of second conductive type main cell wells and a plurality of second conductive type sense wells selectively formed on a surface of the drift layer; a second conductive type sense outer-peripheral well formed to surround the plurality of sense wells on the sur…

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What does patent US8969960B2 cover?
A power semiconductor device includes a second conductive type sense outer-peripheral well formed to surround a plurality of sense wells on the surface of a drift layer, a first conductive type main-cell source region selectively formed on the surface of the main cell well, a first conductive type sense source region selectively formed on the surface of the sense well, a first conductive type c…
Who is the assignee on this patent?
Furukawa Akihiko, Kagawa Yasuhiro, Miura Naruhisa, and 3 more
What technology area does this patent fall under?
Primary CPC classification H10W42/60. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Mar 03 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).