Thin film transistor display panel

US8969872B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-8969872-B2
Application numberUS-201313789335-A
CountryUS
Kind codeB2
Filing dateMar 7, 2013
Priority dateOct 16, 2012
Publication dateMar 3, 2015
Grant dateMar 3, 2015

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A thin film transistor display panel a includes a transparent substrate; a gate electrode positioned on the substrate; a gate insulating layer positioned on the gate electrode; a semiconductor layer positioned on the gate insulating layer and including a channel region; a source electrode and a drain electrode positioned on the semiconductor layer and facing each other; and a passivation layer configured to cover the source electrode, the drain electrode, and the semiconductor layer, wherein the semiconductor layer includes a relatively thick first portion between the source electrode and the gate electrode and a relatively thinner second portion between the drain electrode and the gate electrode overlap, the relatively thick first portion being sufficiently thick to substantially reduce a charge trapping phenomenon that may otherwise occur at a gate electrode to gate dielectric interface if the first portion were as thin as the second portion.

First claim

Opening claim text (preview).

What is claimed is: 1. A thin film transistor display panel, comprising: a substrate; a gate electrode positioned on the substrate; a gate insulating layer positioned on the gate electrode; a semiconductor layer positioned on the gate insulating layer and comprising a channel portion; and a source electrode and a drain electrode positioned on the semiconductor layer and spaced apart from one another; wherein a first portion of the semiconductor layer overlaps both the so…

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What does patent US8969872B2 cover?
A thin film transistor display panel a includes a transparent substrate; a gate electrode positioned on the substrate; a gate insulating layer positioned on the gate electrode; a semiconductor layer positioned on the gate insulating layer and including a channel region; a source electrode and a drain electrode positioned on the semiconductor layer and facing each other; and a passivation layer …
Who is the assignee on this patent?
Samsung Display Co Ltd, Univ Kookmin Ind Acad Coop Found
What technology area does this patent fall under?
Primary CPC classification H10D30/6755. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Mar 03 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).