Wafer processing method
US-9209085-B2 · Dec 8, 2015 · US
US8969752B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8969752-B2 |
| Application number | US-54852203-A |
| Country | US |
| Kind code | B2 |
| Filing date | Sep 11, 2003 |
| Priority date | Mar 12, 2003 |
| Publication date | Mar 3, 2015 |
| Grant date | Mar 3, 2015 |
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Official abstract text for this publication.
The present invention provides a laser processing method comprising the steps of attaching a protective tape 25 to a front face 3 of a wafer 1 a , irradiating a substrate 15 with laser light L while employing a rear face of the wafer 1 a as a laser light entrance surface and locating a light-converging point P within the substrate 15 so as to form a molten processed region 13 due to multiphoton absorption, causing the molten processed region 13 to form a cutting start region 8 inside by a predetermined distance from the laser light entrance surface along a line 5 along which the object is intended to be cut in the wafer 1 a , attaching an expandable tape 23 to the rear face 21 of the wafer 1 a , and expanding the expandable tape 23 so as to separate a plurality of chip parts 24 produced upon cutting the wafer 1 a from the cutting start region 8 acting as a start point from each other.
Opening claim text (preview).
The invention claimed is: 1. A laser processing method for cutting a flat object to be processed including a substrate and a laminate part disposed on the substrate, the method comprising the steps of: attaching a protective film to a front face of the object on the laminate part side; irradiating a portion of a rear face of the object with laser light, after the step of attaching the protective film, wherein the portion of the rear face of the object comprises a laser light ent…
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