Laser processing method

US8969752B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-8969752-B2
Application numberUS-54852203-A
CountryUS
Kind codeB2
Filing dateSep 11, 2003
Priority dateMar 12, 2003
Publication dateMar 3, 2015
Grant dateMar 3, 2015

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present invention provides a laser processing method comprising the steps of attaching a protective tape 25 to a front face 3 of a wafer 1 a , irradiating a substrate 15 with laser light L while employing a rear face of the wafer 1 a as a laser light entrance surface and locating a light-converging point P within the substrate 15 so as to form a molten processed region 13 due to multiphoton absorption, causing the molten processed region 13 to form a cutting start region 8 inside by a predetermined distance from the laser light entrance surface along a line 5 along which the object is intended to be cut in the wafer 1 a , attaching an expandable tape 23 to the rear face 21 of the wafer 1 a , and expanding the expandable tape 23 so as to separate a plurality of chip parts 24 produced upon cutting the wafer 1 a from the cutting start region 8 acting as a start point from each other.

First claim

Opening claim text (preview).

The invention claimed is: 1. A laser processing method for cutting a flat object to be processed including a substrate and a laminate part disposed on the substrate, the method comprising the steps of: attaching a protective film to a front face of the object on the laminate part side; irradiating a portion of a rear face of the object with laser light, after the step of attaching the protective film, wherein the portion of the rear face of the object comprises a laser light ent…

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Frequently asked questions

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What does patent US8969752B2 cover?
The present invention provides a laser processing method comprising the steps of attaching a protective tape 25 to a front face 3 of a wafer 1 a , irradiating a substrate 15 with laser light L while employing a rear face of the wafer 1 a as a laser light entrance surface and locating a light-converging point P within the substrate 15 so as to form a molten processed region 13 d…
Who is the assignee on this patent?
Fukumitsu Kenshi, Fukuyo Fumitsugu, Uchiyama Naoki, and 1 more
What technology area does this patent fall under?
Primary CPC classification B28D5/0011. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Mar 03 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).