Composition for forming silica based layer, and method for manufacturing silica based layer
US-2015337168-A1 · Nov 26, 2015 · US
US8969610B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8969610-B2 |
| Application number | US-201113574376-A |
| Country | US |
| Kind code | B2 |
| Filing date | Feb 16, 2011 |
| Priority date | Feb 26, 2010 |
| Publication date | Mar 3, 2015 |
| Grant date | Mar 3, 2015 |
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The present invention relates to a method for oligomerizing hydridosilanes, wherein a composition comprising substantially at least one non-cyclic hydridosilane having a maximum of 20 silicon atoms as the hydridosilane is thermally converted at temperatures below 235° C. in the absence of a catalyst, the oligomers that can be produced according to the method, and the use thereof.
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The invention claimed is: 1. A process for oligomerizing a hydridosilane, the process comprising: thermally converting, in the absence of a catalyst, a composition comprising a noncyclic hydridosilane comprising a maximum of 20 silicon atoms at a temperature of less than 235° C. 2. The process of claim 1 , being a liquid phase process. 3. The process of claim 1 , wherein the composition comprises a hydridosilane mixture having a weight-average molecular weight, M w , of ≦500 g/mol. 4. The process of claim 1 , further comprising, prior to the thermal conversion: (A) converting a first mixture comprising: i) a halosilane having formula Si n X 2n+2 , wherein n≧3, and X is at least one selected from the group consisting of F, Cl, Br, and I; and ii) a catalyst having formula: NRR′ a R′ b Y c , wherein: a=0 or 1, b=0 or 1 and c=0 or 1; and where aa)—at least one selected from the group consisting of R, R′, and R″ is a —C 1 -C 12 -alkyl, a —C 1 -C 12 -aryl, a —C 1 -C 12 -aralkyl, a —C 1 -C 12 -aminoalkyl, a —C 1 -C 12 -aminoaryl, a —C 1 -C 12 -aminoaralkyl, and/or two or three R, R′, and R″ radicals, in the case that c=0, together form a cyclic or bicyclic, heteroaliphatic or heteroaromatic system comprising N, with the proviso that at least one of the R, R′, or R″ radical is not —CH 3 , and/or bb) at least one selected from the group consisting of (i) R and R′ and (ii) R″ (in the case that c=1) is a —C 1 -C 12 -alkylene, a —C 1 -C 12 -arylene, a —C 1 -C 12 -aralkylene, a —C 1 -C 12 -heteroalkylene, a —C 1 -C 12 -heteroarylene, a —C 1 -C 12 -heteroaralkylene, —N═, or any mixture thereof, or cc) in the case that a=b=c=0, R═≡C—R′″, wherein R′″=a —C 1 -C 10 -alkyl, a —C 1 -C 10 -aryl, a —C 1 -C 10 -aralkyl, or any mixture thereof, to form a second mixture comprising a halosilane of formula Si m X 2m+2 , wherein m>n and X is at least one selected from the group consisting of F, Cl, Br, and I; and SiX 4 wherein X is at least one selected from the group consisting of F, Cl, Br, and I; and then (B) hydrogenating the halosilane of formula Si m X 2m+2 , to form a hydridosilane of having formula Si m H 2m+2 . 5. The process of claim 1 , wherein the composition comprises neopentasilane. 6. The process of claim 1 , wherein the composition further comprises at least one solvent selected from the group consisting of a linear, branched and cyclic, saturated, unsaturated and aromatic hydrocarbon comprising 1 to 12 carbon atoms, an alcohol, an ether, a carboxylic acid, an ester, a nitrile, an amine, an amide, a sulphoxide, and water. 7. The process of claim 1 , wherein the composition further comprises 20-80% by weight of a solvent, based on a total mass of the composition. 8. The process of claim 1 , wherein the composition further comprises at least one dopant selected from the group consisting of: BH x R 3-x , wherein x=0-3 and R=a C 1 -C 10 -alkyl radical, unsaturated cyclic, optionally ether- or amino-complexed C 2 -C 10 -alkyl radical; Si 5 H 9 BR 2 , wherein R═H, Ph, or a C 1 -C 10 -alkyl radical; Si 4 H 9 BR 2 , wherein R═H, Ph, or a C 1 -C 10 -alkyl radical; red phosphorus; white phosphorus (P 4 ); PH x R 3-x , wherein x=0-3 and R=Ph, SiMe 3 , or a C 1 -C 10 -alkyl radical; P 7 (SiR 3 ) 3 , wherein R═H, Ph, or a C 1 -C 10 -alkyl radical; Si 5 H 9 PR 2 , wherein R═H, Ph, or a C 1 -C 10 -alkyl radical; and Si 4 H 9 PR 2 , wherein R═H, Ph, or a C 1 -C 10 -alkyl radical. 9. The process of claim 8 , wherein a content of the dopant in the composition is from 0.01-20% by weight, based on total mass of the composition. 10. The process of claim 1 , further comprising, during the thermal conversion or thereafter: adding a dopant to the composition, wherein the dopant is at least one selected from the group consisting of: BH x R 3-x , wherein x=0-3 and R=a C 1 -C 10 -alkyl radical, unsaturated cyclic, optionally ether- or amino-complexed C 2 -C 10 -alkyl radical; Si 5 H 9 BR 2 , wherein R═H, Ph, or a C 1 -C 10 -alkyl radical; Si 4 H 9 BR 2 , wherein R═H, Ph, or a C 1 -C 10 -alkyl radical; red phosphorus; white phosphorus (P 4 ); PH x R 3-x , wherein x=0-3 and R=Ph, SiMe 3 , or a C 1 -C 10 -alkyl radical; P 7 (SiR 3 ) 3 , wherein R═H, Ph, or a C 1 -C 10 -alkyl radical; Si 5 H 9 PR 2 , wherein R═H, Ph, or a C 1 -C 10 -alkyl radical; and Si 4 H 9 PR 2 , wherein R═H, Ph, or a C 1 -C 10 -alkyl radical. 11. The process of claim 1 , wherein the thermal conversion is performed at a temperature in the range from 70 to 220° C. 12. The process of claim 1 , wherein the composition comprises a hydridosilane mixture having a weight-average molecular weight, M w , of ≦400 g/mol. 13. The process of claim 1 , wherein the composition comprises a hydridosilane mixture having a weight-average molecular weight, M w , of ≦350 g/mol. 14. The process of claim 1 , wherein the noncylic hydridosilane consist essentially of neopentasilane. 15. The process of claim 1 , wherein the thermal conversion is performed at a temperature in the range from 90 to 210° C.
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