Radiation-sensitive resin composition, resist pattern-forming method, acid diffusion control agent, compound, and method for producing compound
US-9529259-B2 · Dec 27, 2016 · US
US8969591B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8969591-B2 |
| Application number | US-201414163682-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 24, 2014 |
| Priority date | Aug 4, 2009 |
| Publication date | Mar 3, 2015 |
| Grant date | Mar 3, 2015 |
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The present invention is directed to provide an efficient production method which is capable of not only obtaining a cyclic sulfonic acid ester (sultone) at low cost and in high yield, but also the sulfonic acid ester (sultone) stably even in a commercial scale. The present invention relates to a method for producing hydroxysultone comprising a first step where a diol having a specified structure and a thionyl halide are reacted to obtain a cyclic sulfite having a specified structure, and a second step where the cyclic sulfite is reacted with water or/and alcohol; a method for producing an unsaturated sultone having a specified structure comprising a third step where a hydroxylsultone having a specified structure is reacted with an acid halide or an acid anhydride to obtain an intermediate, subsequently the intermediate is treated with a base; as well as a cyclic sulfite having a specified structure.
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What is claimed is: 1. A compound represented by the formula [5]: wherein R2, R3, R4 and R5 represent each independently a hydrogen atom or a C1-3 alkyl group, and L represents a C1-6 alkylsulfonyl group which is optionally substituted by a halogen atom, a C6-10 arylsulfonyl group which is optionally substituted by a halogen atom, a C6-10 arylsulfonyl group, a C2-7 alkylcarbony…
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