Holding device, method of determining attraction abnormality in holding device, lithography apparatus, and method of manufacturing article
US-2024393682-A1 · Nov 28, 2024 · US
Safe separation for nano imprinting
US8968620B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8968620-B2 |
| Application number | US-201113095514-A |
| Country | US |
| Kind code | B2 |
| Filing date | Apr 27, 2011 |
| Priority date | Apr 27, 2010 |
| Publication date | Mar 3, 2015 |
| Grant date | Mar 3, 2015 |
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Abstract
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Control of lateral strain and lateral strain ratio (d t /d b ) between template and substrate through the selection of template and/or substrate thicknesses (T t and/or T b ), control of template and/or substrate back pressure (P t and/or P b ), and/or selection of material stiffness are described.
First claim
Opening claim text (preview).
What is claimed is: 1. In a nanoimprint lithography system, a method comprising: providing a template in contact with a formed patterned layer on a substrate, the template and the substrate having lateral strains d t and d b associated therewith, respectively, when subjected to a separation force; determining the difference between the lateral strains d t and d b by either (i) measuring the lateral strain values during an initial separation, or (ii) modeling the lateral stra…
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Cross-Sectional Technologies · mapped topic
- G03F7/0002Primary
Physics · mapped topic
Operations & Transport · mapped topic
Operations & Transport · mapped topic
- B82Y10/00Primary
Operations & Transport · mapped topic
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- What does patent US8968620B2 cover?
- Control of lateral strain and lateral strain ratio (d t /d b ) between template and substrate through the selection of template and/or substrate thicknesses (T t and/or T b ), control of template and/or substrate back pressure (P t and/or P b ), and/or selection of material stiffness are described.
- Who is the assignee on this patent?
- Im Se-Hyuk, Ganapathisubramanian Mahadevan, Fletcher Edward Brian, and 9 more
- What technology area does this patent fall under?
- Primary CPC classification G03F7/0002. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Mar 03 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).