Lifting and drying device and method of manufacturing magnetic recording medium substrate or magnetic recording medium using the same

US8968484B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-8968484-B2
Application numberUS-201113210884-A
CountryUS
Kind codeB2
Filing dateAug 16, 2011
Priority dateAug 18, 2010
Publication dateMar 3, 2015
Grant dateMar 3, 2015

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  5. First independent claim

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Abstract

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Provided is a method of manufacturing a magnetic recording mediums comprising employing a lifting and drying device for cleaning substrates by immersing one or more disk-like substrates with a central hole into a cleaning liquid disposed in a cleaning tank and lifting and drying the substrates, the lifting and drying device including: a hanger mechanism that is inserted through the central hole of the substrates and supports a plurality of the substrates while being hung thereon; an elevation mechanism that elevates the hanger mechanism between a position where the substrates are immersed into the cleaning liquid inside the cleaning tank and a position where the substrates are lifted from the cleaning tank; and an ejection mechanism that is disposed in the cleaning tank and ejects the cleaning liquid from the downside of the hanger mechanism toward the substrate.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method of manufacturing a magnetic recording medium substrate, the method comprising: cleaning the magnetic recording medium substrates using a lifting and drying device for cleaning a substrate by immersing one or more disk-like substrates with a central hole into a cleaning liquid disposed in a cleaning tank, and lifting and drying the substrate, the lifting and drying device comprising: a hanger mechanism that is inserted through the central hol…

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What does patent US8968484B2 cover?
Provided is a method of manufacturing a magnetic recording mediums comprising employing a lifting and drying device for cleaning substrates by immersing one or more disk-like substrates with a central hole into a cleaning liquid disposed in a cleaning tank and lifting and drying the substrates, the lifting and drying device including: a hanger mechanism that is inserted through the central hole…
Who is the assignee on this patent?
Sakaguchi Ryuji, Tanaka Ryo, Oshima Norio, and 1 more
What technology area does this patent fall under?
Primary CPC classification G11B5/8404. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Mar 03 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).