Multicathode deposition system and methods
US-12051576-B2 · Jul 30, 2024 · US
Deposition mask and method for manufacturing organic light emitting display using the same
US8968477B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8968477-B2 |
| Application number | US-57500109-A |
| Country | US |
| Kind code | B2 |
| Filing date | Oct 7, 2009 |
| Priority date | Jul 15, 2004 |
| Publication date | Mar 3, 2015 |
| Grant date | Mar 3, 2015 |
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Abstract
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A deposition mask for manufacturing an organic light emitting display (OLED) using the same are provided. The deposition mask is intended for preventing an organic film from being damaged due to touching of a blocked-off portion of the mask to an emission layer (EML), or chemical transition from being generated at the organic film. For that purpose, the deposition mask stuck to a substrate of the OLED to deposit an organic EML includes an opening and an indentation. The opening is opened so as to deposit the organic EML. The indentation is indented a predetermined depth from a plane facing the substrate.
First claim
Opening claim text (preview).
What is claimed is: 1. A deposition mask, comprising: a planar portion; and unit masks, each unit mask comprising: a single first opening and two first indentations arranged in a first row in the planar portion; and a plurality of second openings and a plurality of second indentations arranged in a second row in the planar portion, wherein: the first and second openings are configured to permit deposition of an organic emission layer on a substrate of an organic light e…
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Electricity · mapped topic
Electricity · mapped topic
- C23C14/042Primary
Chemistry & Metallurgy · mapped topic
Electricity · mapped topic
- H01L27/3211Primary
Electricity · mapped topic
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- What does patent US8968477B2 cover?
- A deposition mask for manufacturing an organic light emitting display (OLED) using the same are provided. The deposition mask is intended for preventing an organic film from being damaged due to touching of a blocked-off portion of the mask to an emission layer (EML), or chemical transition from being generated at the organic film. For that purpose, the deposition mask stuck to a substrate of t…
- Who is the assignee on this patent?
- Kang Chang-Ho, Kim Tae-Seung, Hong Jae-Min, and 1 more
- What technology area does this patent fall under?
- Primary CPC classification C23C14/042. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Mar 03 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).