Holding device, method of determining attraction abnormality in holding device, lithography apparatus, and method of manufacturing article
US-2024393682-A1 · Nov 28, 2024 · US
Optically absorptive material for alignment marks
US8967992B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8967992-B2 |
| Application number | US-201213455966-A |
| Country | US |
| Kind code | B2 |
| Filing date | Apr 25, 2012 |
| Priority date | Apr 25, 2011 |
| Publication date | Mar 3, 2015 |
| Grant date | Mar 3, 2015 |
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Abstract
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Imprint lithography templates having alignment marks with highly absorptive material. The alignment marks are insensitive to the effects of liquid spreading and can provide stability and increase contrast to alignment system during liquid imprint filling of template features.
First claim
Opening claim text (preview).
What is claimed is: 1. An imprint lithography template for patterning formable material positioned on a substrate comprising: a body having a first side and a second side; a mold having a patterned surface, the mold positioned on the first side of the body, the patterned surface having a feature area defining a first pattern; a template alignment mark formed in the patterned surface outside of the feature area, the template alignment mark having a plurality of features that in…
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- G03F7/0002Primary
Physics · mapped topic
Operations & Transport · mapped topic
Physics · mapped topic
Physics · mapped topic
Cross-Sectional Technologies · mapped topic
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Frequently asked questions
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- What does patent US8967992B2 cover?
- Imprint lithography templates having alignment marks with highly absorptive material. The alignment marks are insensitive to the effects of liquid spreading and can provide stability and increase contrast to alignment system during liquid imprint filling of template features.
- Who is the assignee on this patent?
- Khusnatdinov Niyaz, Selinidis Kosta S, Imhof Joseph Michael, and 3 more
- What technology area does this patent fall under?
- Primary CPC classification G03F7/0002. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Mar 03 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).