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Method and system for use in monitoring properties of patterned structures
US8964178B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8964178-B2 |
| Application number | US-201314139913-A |
| Country | US |
| Kind code | B2 |
| Filing date | Dec 24, 2013 |
| Priority date | Jul 11, 2007 |
| Publication date | Feb 24, 2015 |
| Grant date | Feb 24, 2015 |
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Abstract
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A method and system are presented for use in characterizing properties of an article having a structure comprising a multiplicity of sites comprising different periodic patterns, where method includes providing a theoretical model of prediction indicative of optical properties of different stacks defined by geometrical and material parameters of corresponding sites, said sites being common in at least one of geometrical parameter and material parameter; performing optical measurements on at least two different stacks of the article and generating optical measured data indicative of the geometrical parameters and material composition parameters for each of the measured stacks; processing the optical measured data, said processing comprising simultaneously fitting said optical measured data for the multiple measured stacks with said theoretical model and extracting said at least one common parameter, thereby enabling to characterize the properties of the multi-layer structure within the single article.
First claim
Opening claim text (preview).
What is claimed is: 1. A method for characterizing properties of an article having a multi-layer structure comprising a multiplicity of sites comprising different periodic patterns, the method comprising: providing at a memory utility of a control unit connectable to an optical measurement unit a theoretical model of prediction indicative of optical properties of different stacks defined by geometrical and material parameters of corresponding sites, wherein said sites have at leas…
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Physics · mapped topic
- G01B11/0625Primary
Physics · mapped topic
- G01N21/9501Primary
Physics · mapped topic
Physics · mapped topic
- G01B11/06Primary
Physics · mapped topic
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Frequently asked questions
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- What does patent US8964178B2 cover?
- A method and system are presented for use in characterizing properties of an article having a structure comprising a multiplicity of sites comprising different periodic patterns, where method includes providing a theoretical model of prediction indicative of optical properties of different stacks defined by geometrical and material parameters of corresponding sites, said sites being common in a…
- Who is the assignee on this patent?
- Nova Measuring Instr Ltd
- What technology area does this patent fall under?
- Primary CPC classification G01B11/0625. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Feb 24 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).