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Electro-optic device, method of producing electro-optic device, and projection type display apparatus
US8964147B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8964147-B2 |
| Application number | US-201213547122-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jul 12, 2012 |
| Priority date | Jul 21, 2011 |
| Publication date | Feb 24, 2015 |
| Grant date | Feb 24, 2015 |
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- Title
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Abstract
Official abstract text for this publication.
An electro-optic device is provided. In the electro-optic device, when a groove is sealed to be hollow, a sacrificial film is formed in the groove before forming a first sealing film, the first sealing film is formed, and then the sacrificial film is removed through a penetration portion of the first sealing film. A second sealing film is formed on the first sealing film, and the penetration portion of the first sealing film is blocked by the second sealing film. For this reason, it is possible to form the first sealing film to block an opening portion of the groove, and it is possible to prevent the first sealing film from being formed up to the inside of the groove.
First claim
Opening claim text (preview).
What is claimed is: 1. An electro-optic device comprising: a first substrate that is provided with a plurality of pixel electrodes and a plurality of switching elements; a second substrate that is opposed to the first substrate; and an electro-optic material layer that is provided between the first substrate and the second substrate, wherein one substrate of the first substrate and the second substrate is a transparent substrate, and wherein the one substrate is provided w…
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Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
- G02F1/1333Primary
Physics · mapped topic
Physics · mapped topic
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Frequently asked questions
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- What does patent US8964147B2 cover?
- An electro-optic device is provided. In the electro-optic device, when a groove is sealed to be hollow, a sacrificial film is formed in the groove before forming a first sealing film, the first sealing film is formed, and then the sacrificial film is removed through a penetration portion of the first sealing film. A second sealing film is formed on the first sealing film, and the penetration po…
- Who is the assignee on this patent?
- Ito Satoshi, Ono Yohei, Seiko Epson Corp
- What technology area does this patent fall under?
- Primary CPC classification G02F1/1333. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Feb 24 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).