Method of forming semiconductor devices
US-2024387980-A1 · Nov 21, 2024 · US
US8963779B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8963779-B2 |
| Application number | US-201113034025-A |
| Country | US |
| Kind code | B2 |
| Filing date | Feb 24, 2011 |
| Priority date | Nov 8, 2010 |
| Publication date | Feb 24, 2015 |
| Grant date | Feb 24, 2015 |
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Official abstract text for this publication.
The disclosure provides a silicon-based suspending antenna with photonic bandgap structure, which includes a silicon substrate, an electrode layer, a spacing part and an F-shaped structure. The silicon substrate has a first side surface and a second side surface oppositing to the first surface. The electrode layer has a flat part, a first base and at least one second base, in which one side of the flat part has a notch, the first base, the second base and the notch are separately disposed on the second side surface and essentially parallel to the longitudinal edge of the second side surface, the first base has a main body and an extension, and the extension extends from the main body and into the notch. The F-shaped structure has a longitudinal part disposed on the spacing part and is parallel to the second side surface.
Opening claim text (preview).
What is claimed is: 1. A silicon-based suspending antenna with photonic bandgap structure, comprising: a silicon substrate, having a first side surface and a second side surface oppositing to the first surface, the first side surface having a plurality of regular recesses for restraining spurious wave of the silicon-based suspending antenna and the second side surface having a longitudinal edge; an electrode layer, having a flat part, a first base and at least one second base, o…
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
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