Strongly correlated nonvolatile memory element

US8963221B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-8963221-B2
Application numberUS-201414231845-A
CountryUS
Kind codeB2
Filing dateApr 1, 2014
Priority dateOct 19, 2011
Publication dateFeb 24, 2015
Grant dateFeb 24, 2015

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  2. Abstract

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  5. First independent claim

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Abstract

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In aspects of the invention, a strongly correlated nonvolatile memory element is provided which exhibits phase transitions and nonvolatile switching functions through electrical means. In an aspect of the invention, a strongly correlated nonvolatile memory element is provided including, on a substrate, a channel layer, a gate electrode, a gate insulator, a source electrode, and a drain electrode. The channel layer includes a strongly correlated oxide thin film, and is formed of a perovskite type manganite which exhibits a charge-ordered phase or an orbital-ordered phase; the gate insulator is formed in contact with at least a portion of a surface or interface of the channel layer and is sandwiched between the channel layer and the gate electrode, and the source electrode and drain electrode are formed in contact with at least a portion of the channel layer.

First claim

Opening claim text (preview).

What is claimed is: 1. A strongly correlated nonvolatile memory element, comprising, on a substrate: a channel layer including a strongly correlated oxide thin film; a gate electrode; a gate insulator formed in contact with at least a portion of a surface or interface of the channel layer and sandwiched between the channel layer and the gate electrode; and a source electrode and a drain electrode formed in contact with at least a portion of the channel layer, wherein the c…

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What does patent US8963221B2 cover?
In aspects of the invention, a strongly correlated nonvolatile memory element is provided which exhibits phase transitions and nonvolatile switching functions through electrical means. In an aspect of the invention, a strongly correlated nonvolatile memory element is provided including, on a substrate, a channel layer, a gate electrode, a gate insulator, a source electrode, and a drain electrod…
Who is the assignee on this patent?
Fuji Electric Co Ltd
What technology area does this patent fall under?
Primary CPC classification H10N70/253. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Feb 24 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).