Semiconductor structure and method for manufacturing semiconductor structure
US-12046478-B2 · Jul 23, 2024 · US
US8963166B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8963166-B2 |
| Application number | US-201314010558-A |
| Country | US |
| Kind code | B2 |
| Filing date | Aug 27, 2013 |
| Priority date | Nov 30, 2007 |
| Publication date | Feb 24, 2015 |
| Grant date | Feb 24, 2015 |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
Toward making available III nitride crystal substrates advantageously employed in light-emitting devices, and light-emitting devices incorporating the substrates, a III nitride crystal substrate has a major face whose surface area is not less than 10 cm 2 and is characterized by: edge dislocations in the crystal being concentrated along propagation lines forming an angle of some 0° to 5° with a given {0001} plane of the crystal; screw dislocations in the crystal being concentrated along propagation lines forming an angle of some 45° to 60° with the given {0001} plane; and in a major-face principal region excluding the peripheral margin of the major face from its outer periphery to a 5 mm separation from its outer periphery, the total dislocation density being between 1×10 4 cm −2 to 3×10 6 cm −2 inclusive, and the ratio of screw-dislocation density to the total dislocation density being 0.5 or greater.
Opening claim text (preview).
What is claimed is: 1. A Group-III nitride crystal substrate having a major face whose surface area is not less than 10 cm 2 , the III-nitride crystal substrate characterized by: edge dislocations in the crystal being concentrated along propagation lines forming an angle of some 0° to 5° with a given {0001} plane of the crystal; screw dislocations in the crystal being concentrated along propagation lines forming an angle of some 45° to 60° with the given {0001} plane; and in a…
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Related publications grouped by family.
Free tools are coming soon. Tell us what you want to track and we'll notify you.
Answers are generated from the same data shown on this page.