Nitride-based heterostructure field effect transistor having high efficiency

US8963151B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-8963151-B2
Application numberUS-201113226108-A
CountryUS
Kind codeB2
Filing dateSep 6, 2011
Priority dateMay 3, 2011
Publication dateFeb 24, 2015
Grant dateFeb 24, 2015

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Abstract

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A high efficiency HFET may include a substrate, a semi-insulating gallium nitride (GaN) layer formed on the substrate, an aluminum gallium nitride (AlGaN) layer formed on the GaN layer, and a silicon carbide (Si x C 1-x ) functional layer formed on the AlGaN layer.

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What is claimed is: 1. A heterostructure field effect transistor (HFET) comprising: a substrate; a semi-insulating gallium nitride (GaN) layer formed on the substrate; an aluminum gallium nitride (AlGaN) layer formed on the GaN layer; and a silicon carbide (Si x C 1-x ) functional layer formed on the AlGaN layer, wherein x of the Si x C 1-x functional layer has a value in a range of 0.6<x<1, and wherein the Si x C 1-x functional layer is disposed to cover an entire surface of the…

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What does patent US8963151B2 cover?
A high efficiency HFET may include a substrate, a semi-insulating gallium nitride (GaN) layer formed on the substrate, an aluminum gallium nitride (AlGaN) layer formed on the GaN layer, and a silicon carbide (Si x C 1-x ) functional layer formed on the AlGaN layer.
Who is the assignee on this patent?
Lee Jae Hoon, Kim Ki Se, Samsung Electronics Co Ltd
What technology area does this patent fall under?
Primary CPC classification H10D30/4755. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Feb 24 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).