Vaporizer, ion source, ion beam irradiation apparatus, and an operating method for a vaporizer
US-2024186101-A1 · Jun 6, 2024 · US
Nitrogen ions from a gas field ion source held at a pressure of 1.0 x 10^(-6) pa to 1.0 x 10^(-2) pa
US8963100B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8963100-B2 |
| Application number | US-201213654509-A |
| Country | US |
| Kind code | B2 |
| Filing date | Oct 18, 2012 |
| Priority date | Oct 20, 2011 |
| Publication date | Feb 24, 2015 |
| Grant date | Feb 24, 2015 |
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Abstract
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A focused ion beam apparatus has an ion source chamber in which is disposed an emitter for emitting ions. A gas supply unit supplies nitrogen gas to the ion source chamber so that the nitrogen gas adsorbs on the surface of the emitter, and the gas supply unit maintains the pressure in the ion source chamber in the range 1.0×10 −6 Pa to 1.0×10 −2 Pa. An extracting electrode is spaced from the emitter, and a voltage is applied to the extracting electrode to ionize the adsorbed nitrogen gas and extract nitrogen ions in the form of an ion beam. A temperature control unit controls the temperature of the emitter.
First claim
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What is claimed is: 1. A focused ion beam apparatus comprising a gas field ion source, the gas field ion source comprising: an emitter for emitting an ion beam; an ion source chamber containing the emitter; a gas supply unit for supplying nitrogen to the ion source chamber so that the pressure in the ion source chamber is in the range 1.0×10 −6 Pa to 1.0×10 −2 Pa; an extracting electrode to which a voltage for ionizing the nitrogen and for extracting nitrogen ions is appli…
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- What does patent US8963100B2 cover?
- A focused ion beam apparatus has an ion source chamber in which is disposed an emitter for emitting ions. A gas supply unit supplies nitrogen gas to the ion source chamber so that the nitrogen gas adsorbs on the surface of the emitter, and the gas supply unit maintains the pressure in the ion source chamber in the range 1.0×10 −6 Pa to 1.0×10 −2 Pa. An extracting electrode is spaced from the …
- Who is the assignee on this patent?
- Yasaka Anto, Aramaki Fumio, Sugiyama Yasuhiko, and 3 more
- What technology area does this patent fall under?
- Primary CPC classification H01J37/08. Mapped technology areas include Electricity.
- When was this patent published?
- Publication date Tue Feb 24 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).