Bump, method for forming the bump, and method for mounting substrate having the bump thereon

US8962471B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-8962471-B2
Application numberUS-201313912826-A
CountryUS
Kind codeB2
Filing dateJun 7, 2013
Priority dateMar 6, 2009
Publication dateFeb 24, 2015
Grant dateFeb 24, 2015

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Abstract

Official abstract text for this publication.

A two-layer structure bump including a first bump layer of a bulk body of a first conductive metal, which is any of gold, copper, and nickel, formed on a substrate and a second bump layer of a sintered body of a powder of a second conductive metal, which is any of gold and silver, formed on the first bump layer. The bulk body composing the first bump layer is formed through any of plating, sputtering, or CVD. The sintered body composing the second bump layer is formed by sintering the powder of the second conductive metal having a purity of not lower than 99.9 wt % and an average particle diameter of 0.005 μm to 1.0 μm. The second bump layer has a Young's modulus 0.1 to 0.4 times that of the first bump layer.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of producing bumps of a conductive metal formed in a predetermined pattern on a substrate, the bump comprising: a two-layer structure of a first bump layer of a bulk body of a first conductive metal, which is any of gold, copper, and nickel, formed on the substrate and a second bump layer of a sintered body of a powder of a second conductive metal, which is either gold or silver, formed on the first bump layer; the bulk body composing the first bump…

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What does patent US8962471B2 cover?
A two-layer structure bump including a first bump layer of a bulk body of a first conductive metal, which is any of gold, copper, and nickel, formed on a substrate and a second bump layer of a sintered body of a powder of a second conductive metal, which is any of gold and silver, formed on the first bump layer. The bulk body composing the first bump layer is formed through any of plating, sput…
Who is the assignee on this patent?
Ogashiwa Toshinori, Miyairi Masayuki, Tanaka Precious Metal Ind
What technology area does this patent fall under?
Primary CPC classification H10W72/072. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Feb 24 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).