Optoelectronic component and method for producing same
US-12176444-B2 · Dec 24, 2024 · US
US8962471B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8962471-B2 |
| Application number | US-201313912826-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jun 7, 2013 |
| Priority date | Mar 6, 2009 |
| Publication date | Feb 24, 2015 |
| Grant date | Feb 24, 2015 |
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A two-layer structure bump including a first bump layer of a bulk body of a first conductive metal, which is any of gold, copper, and nickel, formed on a substrate and a second bump layer of a sintered body of a powder of a second conductive metal, which is any of gold and silver, formed on the first bump layer. The bulk body composing the first bump layer is formed through any of plating, sputtering, or CVD. The sintered body composing the second bump layer is formed by sintering the powder of the second conductive metal having a purity of not lower than 99.9 wt % and an average particle diameter of 0.005 μm to 1.0 μm. The second bump layer has a Young's modulus 0.1 to 0.4 times that of the first bump layer.
Opening claim text (preview).
What is claimed is: 1. A method of producing bumps of a conductive metal formed in a predetermined pattern on a substrate, the bump comprising: a two-layer structure of a first bump layer of a bulk body of a first conductive metal, which is any of gold, copper, and nickel, formed on the substrate and a second bump layer of a sintered body of a powder of a second conductive metal, which is either gold or silver, formed on the first bump layer; the bulk body composing the first bump…
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
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