Multi-stack nanosheet structure including semiconductor device
US-2024023326-A1 · Jan 18, 2024 · US
Metal fuse structure for improved programming capability
US8962467B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8962467-B2 |
| Application number | US-201213399266-A |
| Country | US |
| Kind code | B2 |
| Filing date | Feb 17, 2012 |
| Priority date | Feb 17, 2012 |
| Publication date | Feb 24, 2015 |
| Grant date | Feb 24, 2015 |
How to read this patent
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
- Title
What the patent document calls the invention.
- Abstract
A short plain-language summary of the technical disclosure.
- Assignees and inventors
Who owns or filed the patent and who is credited as inventor.
- Key dates
Filing, priority, publication, and grant dates set the timeline.
- First independent claim
The legal scope of protection — read this for what is actually claimed.
- CPC / IPC classifications
Technology tags used to group this patent with similar filings.
- Citations and related patents
Prior art links and similar publications in this corpus.
Abstract
Official abstract text for this publication.
Structure providing more reliable fuse blow location, and method of making the same. A vertical metal fuse blow structure has, prior to fuse blow, an intentionally damaged portion of the fuse conductor. The damaged portion helps the fuse blow in a known location, thereby decreasing the resistance variability in post-blow circuits. At the same time, prior to fuse blow, the fuse structure is able to operate normally. The damaged portion of the fuse conductor is made by forming an opening in a cap layer above a portion of the fuse conductor, and etching the fuse conductor. Preferably, the opening is aligned such that the damaged portion is on the top corner of the fuse conductor. A cavity can be formed in the insulator adjacent to the damaged fuse conductor. The damaged fuse structure having a cavity can be easily incorporated in a process of making integrated circuits having air gaps.
First claim
Opening claim text (preview).
What is claimed is: 1. The method of forming a fuse structure comprising: providing a substrate having a first level comprising a first conductor and a first insulator; providing a fuse level above the first level, wherein the fuse level has a fuse insulator, a fuse conductor, and a cap layer above the fuse insulator and the fuse conductor; forming an opening in the cap layer; damaging a portion of the fuse conductor thereby forming a damaged portion of the fuse conductor; a…
Assignees
Inventors
Classifications
Electricity · mapped topic
Electricity · mapped topic
- H10W20/493Primary
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Patent family
Related publications grouped by family.
External sources
Next steps
Free tools are coming soon. Tell us what you want to track and we'll notify you.
Frequently asked questions
Answers are generated from the same data shown on this page.
- What does patent US8962467B2 cover?
- Structure providing more reliable fuse blow location, and method of making the same. A vertical metal fuse blow structure has, prior to fuse blow, an intentionally damaged portion of the fuse conductor. The damaged portion helps the fuse blow in a known location, thereby decreasing the resistance variability in post-blow circuits. At the same time, prior to fuse blow, the fuse structure is able…
- Who is the assignee on this patent?
- Bonilla Griselda, Chanda Kaushik, Choi Samuel S, and 6 more
- What technology area does this patent fall under?
- Primary CPC classification H10W20/493. Mapped technology areas include Electricity.
- When was this patent published?
- Publication date Tue Feb 24 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).