Magnetic memory device, and manufacturing method of magnetic memory device
US-2024315049-A1 · Sep 19, 2024 · US
US8962348B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8962348-B2 |
| Application number | US-201314032599-A |
| Country | US |
| Kind code | B2 |
| Filing date | Sep 20, 2013 |
| Priority date | May 10, 2011 |
| Publication date | Feb 24, 2015 |
| Grant date | Feb 24, 2015 |
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A method for forming a MTJ in a spintronic device is disclosed and includes a thin seed layer that enhances perpendicular magnetic anisotropy (PMA) in an overlying laminated layer with a (Co/Ni) n composition. The seed layer is preferably NiCr, NiFeCr, Hf, or a composite thereof. Furthermore, a magnetic layer such as CoFeB may be formed between the laminated layer and a tunnel barrier layer to serve as a transitional layer between a (111) laminate and (100) MgO tunnel barrier. There may be a Ta insertion layer between the CoFeB layer and laminated layer to promote (100) crystallization in the CoFeB layer. The laminated layer may be used as a reference layer, dipole layer, or free layer in a MTJ. Annealing between 300° C. and 400° C. may be used to further enhance PMA in the laminated layer.
Opening claim text (preview).
We claim: 1. A method of forming a magnetic tunnel junction (MTJ); comprising: (a) forming a seed layer on a substrate, the seed layer consists of a Hf/NiCr, Hf/NiFeCr, NiFeCr/Hf, or NiCr/Hf configuration and a thickness of the NiCr layer or the NiFeCr layer is greater than a thickness of the Hf layer, the seed layer enhances perpendicular magnetic anisotropy (PMA) in an overlying laminated layer; and (b) forming the laminated layer having instrinsic PMA that contacts a top surf…
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