Co/Ni multilayers with improved out-of-plane anisotropy for magnetic device applications

US8962348B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-8962348-B2
Application numberUS-201314032599-A
CountryUS
Kind codeB2
Filing dateSep 20, 2013
Priority dateMay 10, 2011
Publication dateFeb 24, 2015
Grant dateFeb 24, 2015

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Abstract

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A method for forming a MTJ in a spintronic device is disclosed and includes a thin seed layer that enhances perpendicular magnetic anisotropy (PMA) in an overlying laminated layer with a (Co/Ni) n composition. The seed layer is preferably NiCr, NiFeCr, Hf, or a composite thereof. Furthermore, a magnetic layer such as CoFeB may be formed between the laminated layer and a tunnel barrier layer to serve as a transitional layer between a (111) laminate and (100) MgO tunnel barrier. There may be a Ta insertion layer between the CoFeB layer and laminated layer to promote (100) crystallization in the CoFeB layer. The laminated layer may be used as a reference layer, dipole layer, or free layer in a MTJ. Annealing between 300° C. and 400° C. may be used to further enhance PMA in the laminated layer.

First claim

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We claim: 1. A method of forming a magnetic tunnel junction (MTJ); comprising: (a) forming a seed layer on a substrate, the seed layer consists of a Hf/NiCr, Hf/NiFeCr, NiFeCr/Hf, or NiCr/Hf configuration and a thickness of the NiCr layer or the NiFeCr layer is greater than a thickness of the Hf layer, the seed layer enhances perpendicular magnetic anisotropy (PMA) in an overlying laminated layer; and (b) forming the laminated layer having instrinsic PMA that contacts a top surf…

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What does patent US8962348B2 cover?
A method for forming a MTJ in a spintronic device is disclosed and includes a thin seed layer that enhances perpendicular magnetic anisotropy (PMA) in an overlying laminated layer with a (Co/Ni) n composition. The seed layer is preferably NiCr, NiFeCr, Hf, or a composite thereof. Furthermore, a magnetic layer such as CoFeB may be formed between the laminated layer and a tunnel barrier layer to…
Who is the assignee on this patent?
Headway Technologies Inc
What technology area does this patent fall under?
Primary CPC classification H10N50/85. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Feb 24 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).