Salt and photoresist composition containing the same
US-10160721-B2 · Dec 25, 2018 · US
Actinic-ray—or radiation-sensitive resin composition and method of forming pattern using the composition
US8962233B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8962233-B2 |
| Application number | US-201113015874-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 28, 2011 |
| Priority date | Jan 29, 2010 |
| Publication date | Feb 24, 2015 |
| Grant date | Feb 24, 2015 |
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Abstract
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According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes an arylsulfonium salt that when exposed to actinic rays or radiation, generates an acid, the arylsulfonium salt containing at least one aryl ring on which there are a total of one or more electron donating groups, the acid generated upon exposure to actinic rays or radiation having a volume of 240 Å 3 or greater.
First claim
Opening claim text (preview).
What is claimed is: 1. An actinic-ray- or radiation-sensitive resin composition comprising an arylsulfonium salt that when exposed to actinic rays or radiation, generates an acid, the arylsulfonium salt containing at least one aryl ring on which there are a total of one or more electron donating groups, the acid generated upon exposure to actinic rays or radiation having a volume of 240 Å3 or greater, wherein the arylsulfonium salt contains any of cation moieties of general formul…
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Physics · mapped topic
- C07D327/08Primary
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
Physics · mapped topic
- C07C309/31Primary
Chemistry & Metallurgy · mapped topic
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- What does patent US8962233B2 cover?
- According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes an arylsulfonium salt that when exposed to actinic rays or radiation, generates an acid, the arylsulfonium salt containing at least one aryl ring on which there are a total of one or more electron donating groups, the acid generated upon exposure to actinic rays or radiation having a volume of 240 Å 3…
- Who is the assignee on this patent?
- Kawabata Takeshi, Tsuchimura Tomotaka, Ito Takayuki, and 1 more
- What technology area does this patent fall under?
- Primary CPC classification C07D327/08. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Feb 24 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).