Vapor deposition particle emitting device, vapor deposition apparatus, vapor deposition method

US8962077B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-8962077-B2
Application numberUS-201214004894-A
CountryUS
Kind codeB2
Filing dateMar 7, 2012
Priority dateMar 14, 2011
Publication dateFeb 24, 2015
Grant dateFeb 24, 2015

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

Official abstract text for this publication.

A vapor deposition particle emitting device ( 30 ) includes a hollow rotor ( 40 ) provided with a first and a second nozzle sections ( 50 and 60 ), a rolling mechanism, and heat exchangers ( 52 and 62 ), and when the rolling mechanism causes the rotor ( 40 ) to rotate, the heat exchangers ( 52 and 62 ) switch between cooling and heating in accordance with placement of the nozzle section so that that one of the nozzle sections which faces outward has a temperature lower than a temperature at which vapor deposition material turns into gas and the other nozzle section has a temperature equal to or higher than the temperature at which the vapor deposition material turns into the gas.

First claim

Opening claim text (preview).

The invention claimed is: 1. A vapor deposition particle emitting device, including a vapor deposition particle generating section which generates a gas of vapor deposition particles by heating a vapor deposition material, for turning the vapor deposition material into the gas of vapor deposition particles by heating the vapor deposition material and for emitting the vapor deposition particles outward, the vapor deposition particle emitting device comprising: a rotor which is holl…

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What does patent US8962077B2 cover?
A vapor deposition particle emitting device ( 30 ) includes a hollow rotor ( 40 ) provided with a first and a second nozzle sections ( 50 and 60 ), a rolling mechanism, and heat exchangers ( 52 and 62 ), and when the rolling mechanism causes the rotor ( 40 ) to rotate, the heat exchangers ( 52 and 62 ) switch between cooling and heating in accordance with placement of the nozzle section s…
Who is the assignee on this patent?
Inoue Satoshi, Kawato Shinichi, Sonoda Tohru, and 1 more
What technology area does this patent fall under?
Primary CPC classification C23C14/042. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Feb 24 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).