Holding device, method of determining attraction abnormality in holding device, lithography apparatus, and method of manufacturing article
US-2024393682-A1 · Nov 28, 2024 · US
Silicon pen nanolithography
US8961853B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8961853-B2 |
| Application number | US-201013375361-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jun 4, 2010 |
| Priority date | Jun 5, 2009 |
| Publication date | Feb 24, 2015 |
| Grant date | Feb 24, 2015 |
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- Title
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Abstract
Official abstract text for this publication.
Disclosed are methods of lithography using a tip array having a plurality of pens attached to a backing layer, where the tips can comprise a metal, metalloid, and/or semi-conducting material, and the backing layer can comprise an elastomeric polymer. The tip array can be used to perform a lithography process in which the tips are coated with an ink (e.g., a patterning composition) that is deposited onto a substrate upon contact of the tip with the substrate surface. The tips can be easily leveled onto a substrate and the leveling can be monitored optically by a change in light reflection of the backing layer and/or near the vicinity of the tips upon contact of the tip to the substrate surface.
First claim
Opening claim text (preview).
What is claimed: 1. A tip array comprising a plurality of tips fixed to an elastomeric backing layer, the tips comprising a metal, a metalloid, a semi-conducting material, or a combination thereof, and each tip having a radius of curvature of less than 100 nm. 2. The tip array of claim 1 , wherein the backing layer is at least translucent. 3. The tip array of claim 1 , wherein the backing layer comprises an elastomeric polymer.…
Assignees
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Operations & Transport · mapped topic
Operations & Transport · mapped topic
- G03F7/0002Primary
Physics · mapped topic
Operations & Transport · mapped topic
Operations & Transport · mapped topic
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Frequently asked questions
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- What does patent US8961853B2 cover?
- Disclosed are methods of lithography using a tip array having a plurality of pens attached to a backing layer, where the tips can comprise a metal, metalloid, and/or semi-conducting material, and the backing layer can comprise an elastomeric polymer. The tip array can be used to perform a lithography process in which the tips are coated with an ink (e.g., a patterning composition) that is depos…
- Who is the assignee on this patent?
- Mirkin Chad A, Shim Wooyoung, Braunschweig Adam B, and 6 more
- What technology area does this patent fall under?
- Primary CPC classification G03F7/0002. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Feb 24 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).