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Plasma generator and method for cleaning an object
US8961694B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8961694-B2 |
| Application number | US-52032707-A |
| Country | US |
| Kind code | B2 |
| Filing date | Dec 21, 2007 |
| Priority date | Dec 21, 2006 |
| Publication date | Feb 24, 2015 |
| Grant date | Feb 24, 2015 |
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- Title
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Abstract
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The invention relates to a plasma generator ( 1 ) for cleaning an object. The plasma generator ( 1 ) comprises a plasma chamber ( 2 ) and a support structure ( 6 ) arranged in the plasma chamber for supporting the object ( 7 ) to be cleaned. Further, the plasma generator comprises an electromagnetic shield ( 5 a, 5 b, 5 c ) counteracting a flow of charged plasma particles flowing from a plasma generating region towards the object, and a plasma source ( 8 ). In addition, the plasma generator comprises an additional plasma source ( 9,10 ) to form a composition of plasma sources that are arranged to generate in the plasma generating region plasmas, respectively, that mutually interact during operation of the plasma generator so as to force plasma particles to flow in a diffusely closed flow path.
First claim
Opening claim text (preview).
The invention claimed is: 1. A method for cleaning an object using plasma, comprising the steps of: placing the object on a support structure in a chamber; generating plasma from at least three plasma sources; sequentially starting operation of adjacent ones of the at least three plasma sources using a sequential timer, the timer configured to cause the at least three plasma sources to generate plasma in a phased sequence relative to each other, in order to produce a looping f…
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Classifications
- H01J37/3266Primary
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
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Frequently asked questions
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- What does patent US8961694B2 cover?
- The invention relates to a plasma generator ( 1 ) for cleaning an object. The plasma generator ( 1 ) comprises a plasma chamber ( 2 ) and a support structure ( 6 ) arranged in the plasma chamber for supporting the object ( 7 ) to be cleaned. Further, the plasma generator comprises an electromagnetic shield ( 5 a, 5 b, 5 c ) counteracting a flow of charged plasma particles flowing fr…
- Who is the assignee on this patent?
- Wieringa Fokko Pieter, Koster Norbertus Benedictus, Van Vliet Roland, and 2 more
- What technology area does this patent fall under?
- Primary CPC classification H01J37/3266. Mapped technology areas include Electricity.
- When was this patent published?
- Publication date Tue Feb 24 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).