Active matrix substrate and liquid crystal display device
US-2024377690-A1 · Nov 14, 2024 · US
US8957421B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8957421-B2 |
| Application number | US-201213680781-A |
| Country | US |
| Kind code | B2 |
| Filing date | Nov 19, 2012 |
| Priority date | Aug 20, 2012 |
| Publication date | Feb 17, 2015 |
| Grant date | Feb 17, 2015 |
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In a flat panel display (FPD) and a method of manufacturing the same, the FPD includes a substrate, a semiconductor layer formed on the substrate, a wiring line formed on the substrate so as to be separated from the semiconductor layer, an insulating layer formed on the semiconductor layer and the wiring line, a gate electrode formed on the insulating layer formed on the semiconductor layer and extended to a top of the wiring line, and a source electrode and a drain electrode coupled to a source region and a drain region, respectively, of the semiconductor layer. Capacitance is formed by the gate electrode and the wiring line.
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What is claimed is: 1. A flat panel display (FPD) device, comprising: a substrate; a semiconductor layer formed on the substrate; a wiring line formed on the substrate so as to be separated from the semiconductor layer; an insulating layer formed on the semiconductor layer and the wiring line; a gate electrode formed on the insulating layer, the gate electrode continuously and completely overlying the wiring line which is formed on the semiconductor layer, and extended to…
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