Breaking-in and cleaning method and apparatus for wafer-cleaning brush
US-2024066566-A1 · Feb 29, 2024 · US
Silicon wafer cleaning agent
US8957005B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8957005-B2 |
| Application number | US-88289810-A |
| Country | US |
| Kind code | B2 |
| Filing date | Sep 15, 2010 |
| Priority date | Jan 21, 2009 |
| Publication date | Feb 17, 2015 |
| Grant date | Feb 17, 2015 |
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- Title
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Abstract
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A silicon wafer cleaning agent includes at least a water-based cleaning liquid, and a water-repellent cleaning liquid for providing water-repellent to an uneven pattern at least at recessed portions during a cleaning process. The water-repellent cleaning liquid is a liquid composed of a water-repellent compound containing a reactive moiety which is chemically bondable to Si in the silicon wafer, and a hydrophobic group, or is a liquid wherein 0.1 mass % or more of the water-repellent compound relative to the total quantity of 100 mass % of the water-repellent cleaning liquid and an organic solvent are mixed and contained therein. A cleaning process wherein a pattern collapse is easily induced can be improved by using the cleaning agent.
First claim
Opening claim text (preview).
The invention claimed is: 1. A cleaning agent for substituting a cleaning liquid retained in recessed portions of a silicon wafer having a finely uneven pattern at its surface with another cleaning liquid, said cleaning agent comprising: a) a water-based first cleaning liquid; and b) a water-repellent second cleaning liquid for imparting water repellency at least to the recessed portions of the uneven pattern during a cleaning process, said water-repellent second cleaning liquid…
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Classifications
- H10P70/15Primary
Electricity · mapped topic
- H01L21/02052Primary
Electricity · mapped topic
Chemistry & Metallurgy · mapped topic
- C11D7/30Primary
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
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Frequently asked questions
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- What does patent US8957005B2 cover?
- A silicon wafer cleaning agent includes at least a water-based cleaning liquid, and a water-repellent cleaning liquid for providing water-repellent to an uneven pattern at least at recessed portions during a cleaning process. The water-repellent cleaning liquid is a liquid composed of a water-repellent compound containing a reactive moiety which is chemically bondable to Si in the silicon wafer…
- Who is the assignee on this patent?
- Kumon Soichi, Saito Masanori, Saio Takashi, and 3 more
- What technology area does this patent fall under?
- Primary CPC classification H10P70/15. Mapped technology areas include Electricity.
- When was this patent published?
- Publication date Tue Feb 17 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).