Waterborne Clear Ink Compositions
US-2019367751-A1 · Dec 5, 2019 · US
Evaporative systems and methods for dampening fluid control in a digital lithographic system
US8950322B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8950322-B2 |
| Application number | US-201213426209-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 21, 2012 |
| Priority date | Mar 21, 2012 |
| Publication date | Feb 10, 2015 |
| Grant date | Feb 10, 2015 |
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- Title
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Abstract
Official abstract text for this publication.
A system and corresponding methods are disclosed for controlling the thickness of a layer of dampening fluid applied to a reimageable surface of an imaging member in a variable data lithography system. Following deposition of the dampening fluid layer, a gas is passed over a region of the fluid layer prior to pattern forming. The gas causes a controlled amount of the dampening fluid layer to evaporate such that the remaining layer is of a desired and controlled thickness. Among other advantages, improved print quality is obtained.
First claim
Opening claim text (preview).
What is claimed is: 1. An evaporative thickness control subsystem for controlling the thickness of a dampening fluid layer in a variable data lithography system of the type in which the dampening fluid layer is applied by a dampening fluid subsystem over a reimageable surface of an imaging member, comprising: a gas source; a gas-directing nozzle, communicatively coupled to said gas source, configured to be disposed proximate said reimageable surface, and further disposed in a di…
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Classifications
Operations & Transport · mapped topic
Operations & Transport · mapped topic
- B41C1/1033Primary
Operations & Transport · mapped topic
Operations & Transport · mapped topic
Operations & Transport · mapped topic
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Frequently asked questions
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- What does patent US8950322B2 cover?
- A system and corresponding methods are disclosed for controlling the thickness of a layer of dampening fluid applied to a reimageable surface of an imaging member in a variable data lithography system. Following deposition of the dampening fluid layer, a gas is passed over a region of the fluid layer prior to pattern forming. The gas causes a controlled amount of the dampening fluid layer to ev…
- Who is the assignee on this patent?
- Liu Chu-Heng, Knausdorf Peter, Xerox Corp
- What technology area does this patent fall under?
- Primary CPC classification B41C1/1033. Mapped technology areas include Operations & Transport.
- When was this patent published?
- Publication date Tue Feb 10 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).