Method of extracting properties of a layer on a wafer
US-2024234216-A9 · Jul 11, 2024 · US
Surface inspecting apparatus and method for calibrating same
US8949043B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8949043-B2 |
| Application number | US-201013202734-A |
| Country | US |
| Kind code | B2 |
| Filing date | Feb 2, 2010 |
| Priority date | Feb 27, 2009 |
| Publication date | Feb 3, 2015 |
| Grant date | Feb 3, 2015 |
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Abstract
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While an illumination optical system is irradiating the surface of a contaminated standard wafer with illumination light, this illumination light is scanned over the surface of the contaminated standard wafer, then detectors of a detection optical system each detect the light scattered from the surface of the contaminated standard wafer, next a predefined reference value in addition to detection results on the scattered light is used to calculate a compensation parameter “Comp” for detection sensitivity correction of photomultiplier tubes of the detectors, and the compensation parameter “Comp” is separated into a time-varying deterioration parameter “P”, an optical characteristics parameter “Opt”, and a sensor characteristics parameter “Lr”, and correspondingly managed. This makes is easy to calibrate the detection sensitivity.
First claim
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The invention claimed is: 1. A surface inspecting apparatus comprising: a light unit that irradiates with illumination light a surface of a body to be inspected; a scanner that scans the light irradiated from the light unit over the surface of the to-be-inspected body; at least one light detector that detects the light scattered from the surface of the body to be inspected; a processor configured to: use a predefined reference value, as well as a detection result on measuri…
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- G01N21/9501Primary
Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
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Frequently asked questions
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- What does patent US8949043B2 cover?
- While an illumination optical system is irradiating the surface of a contaminated standard wafer with illumination light, this illumination light is scanned over the surface of the contaminated standard wafer, then detectors of a detection optical system each detect the light scattered from the surface of the contaminated standard wafer, next a predefined reference value in addition to detectio…
- Who is the assignee on this patent?
- Oka Kenji, Mitomo Kenji, Komeda Kenichiro, and 1 more
- What technology area does this patent fall under?
- Primary CPC classification G01N21/9501. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Feb 03 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).