Substrate processing system, substrate processing apparatus and display method of substrate processing apparatus

US8948899B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-8948899-B2
Application numberUS-201113211105-A
CountryUS
Kind codeB2
Filing dateAug 16, 2011
Priority dateSep 13, 2010
Publication dateFeb 3, 2015
Grant dateFeb 3, 2015

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  2. Abstract

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  5. First independent claim

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Abstract

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Provided are a substrate processing apparatus, a display method thereof, and a substrate processing system capable of detecting any change in the condition of each component of a substrate processing apparatus. In the substrate processing system including the substrate processing apparatus for processing a substrate and a group management apparatus connected thereto, the substrate processing apparatus is configured to acquire monitor data representing at least the condition of each component of the substrate processing apparatus, aggregate a plurality of the monitor data to generate package data including at least one of a maximum value, an average value, and a minimum value of the monitor data, and transmit the package data to the group management apparatus. The group management apparatus is configured to receive the package data from the substrate processing apparatus and readably store the same therein.

First claim

Opening claim text (preview).

What is claimed is: 1. A substrate processing apparatus configured to generate package data including a maximum value, an average value, and a minimum value of monitor data associated with a condition of each component of the substrate processing apparatus in predetermined cycles, wherein the substrate processing apparatus acquires the monitor data representing at least the condition of each component of the substrate processing apparatus, updates the package data based on the moni…

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What does patent US8948899B2 cover?
Provided are a substrate processing apparatus, a display method thereof, and a substrate processing system capable of detecting any change in the condition of each component of a substrate processing apparatus. In the substrate processing system including the substrate processing apparatus for processing a substrate and a group management apparatus connected thereto, the substrate processing ap…
Who is the assignee on this patent?
Asai Kazuhide, Hitachi Int Electric Inc
What technology area does this patent fall under?
Primary CPC classification G05B23/0221. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Feb 03 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).