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Measurement method, measurement apparatus, exposure method, and exposure apparatus

US8947665B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-8947665-B2
Application numberUS-201213495284-A
CountryUS
Kind codeB2
Filing dateJun 13, 2012
Priority dateApr 23, 2004
Publication dateFeb 3, 2015
Grant dateFeb 3, 2015

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

To perform high-speed and highly accurate measurement by setting desired measuring conditions for each measuring object. In an alignment sensor of exposure apparatus, in the case of performing position measurement for a plurality of sample shots, measurement is performed by changing the measuring conditions, in response to a measuring axis direction, a mark or a layer whereupon a mark to be measured exists. At that time, for the measuring objects to be measured under the same measuring conditions, for example, a position in a Y axis direction and a position in an X axis direction, measurement is continuously performed. When the measuring condition is changed, a baseline value is remeasured. The changeable measuring conditions are wavelength of measuring light, use and selection of a retarder, NA and σ of an optical system, a light quantity of measuring light, illumination shape, signal processing algorithm, etc.

First claim

Opening claim text (preview).

The invention claimed is: 1. A measurement apparatus, which measures a plurality of X marks and a plurality of Y marks, which are measurement objects formed on a prescribed substrate, comprising: an illumination system which illuminates the X and Y marks; a light-receiving system which receives a beam generated from the illuminated X marks and a beam generated from the illuminated Y marks; a computation unit which processes a signal obtained by receiving the beam generated fro…

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Frequently asked questions

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What does patent US8947665B2 cover?
To perform high-speed and highly accurate measurement by setting desired measuring conditions for each measuring object. In an alignment sensor of exposure apparatus, in the case of performing position measurement for a plurality of sample shots, measurement is performed by changing the measuring conditions, in response to a measuring axis direction, a mark or a layer whereupon a mark to be mea…
Who is the assignee on this patent?
Kobayashi Mitsuru, Yasuda Masahiko, Nikon Corp
What technology area does this patent fall under?
Primary CPC classification G03F9/7046. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Feb 03 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).