Wafer Stage Temperature Control
US-2015338747-A1 · Nov 26, 2015 · US
Lithographic apparatus and method controlling parameter drift by performing multiple patterning passes on reference substrate
US8947643B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8947643-B2 |
| Application number | US-201113010409-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 20, 2011 |
| Priority date | Feb 19, 2010 |
| Publication date | Feb 3, 2015 |
| Grant date | Feb 3, 2015 |
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Abstract
Official abstract text for this publication.
A method produces at least one monitor wafer for a lithographic apparatus. The monitor wafer is for use in combination with a scanning control module to periodically retrieve measurements defining a baseline from the monitor wafer, thereby determining parameter drift from the baseline. In doing this, allowance and/or correction can be to be made for the drift. The baseline is determined by initially exposing the monitor wafer(s) using the lithographic apparatus to perform multiple exposure passes on each of the monitor wafer(s). An associated lithographic apparatus is also disclosed.
First claim
Opening claim text (preview).
What is claimed is: 1. A lithographic apparatus comprising: a support configured to support a patterning device; a substrate table configured to hold a substrate; a projection system configured to transfer a pattern from the patterning device into a target portion of the substrate; and a control module configured to periodically retrieve measurements defining baseline control parameters from one or more reference substrates and to determine parameter drift from the baseline…
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Physics · mapped topic
- G03F7/70516Primary
Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
- H10P76/2041Primary
Electricity · mapped topic
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Frequently asked questions
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- What does patent US8947643B2 cover?
- A method produces at least one monitor wafer for a lithographic apparatus. The monitor wafer is for use in combination with a scanning control module to periodically retrieve measurements defining a baseline from the monitor wafer, thereby determining parameter drift from the baseline. In doing this, allowance and/or correction can be to be made for the drift. The baseline is determined by init…
- Who is the assignee on this patent?
- Padiy Alexander Viktorovych, Menchtchikov Boris, Asml Netherlands Bv
- What technology area does this patent fall under?
- Primary CPC classification G03F7/70516. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Feb 03 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).