Methods of forming semiconductor devices
US-2024387699-A1 · Nov 21, 2024 · US
Prevention of line bending and tilting for etch with tri-layer mask
US8946091B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8946091-B2 |
| Application number | US-201113096697-A |
| Country | US |
| Kind code | B2 |
| Filing date | Apr 28, 2011 |
| Priority date | Apr 28, 2011 |
| Publication date | Feb 3, 2015 |
| Grant date | Feb 3, 2015 |
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Abstract
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A method for etching features in an etch layer is provided. An organic mask layer is etched, using a hard mask as an etch mask. The hard mask is removed, by selectively etching the hard mask with respect to the organic mask and etch layer. Features are etched in the etch layer, using the organic mask as an etch mask.
First claim
Opening claim text (preview).
What is claimed is: 1. A method for etching features in an etch layer, comprising: etching an organic mask layer, using a hard mask as an etch mask; completely removing the hard mask, by selectively etching the hard mask with respect to the organic mask and etch layer; etching features in the etch layer, using the organic mask as an etch mask, wherein the hard mask defines wider lines and narrower lines adjacent to the wider lines, and wherein the removing the hard mask redu…
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Electricity · mapped topic
Electricity · mapped topic
- H10P50/73Primary
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
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Frequently asked questions
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- What does patent US8946091B2 cover?
- A method for etching features in an etch layer is provided. An organic mask layer is etched, using a hard mask as an etch mask. The hard mask is removed, by selectively etching the hard mask with respect to the organic mask and etch layer. Features are etched in the etch layer, using the organic mask as an etch mask.
- Who is the assignee on this patent?
- Oh Youn-Jin, Takeshita Kenji, Takahashi Hitoshi, and 1 more
- What technology area does this patent fall under?
- Primary CPC classification H10P50/73. Mapped technology areas include Electricity.
- When was this patent published?
- Publication date Tue Feb 03 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).