Light Emitting Diode Epitaxial Structure and Light Emitting Diode
US-2024297271-A1 · Sep 5, 2024 · US
US8945975B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8945975-B2 |
| Application number | US-201414178983-A |
| Country | US |
| Kind code | B2 |
| Filing date | Feb 12, 2014 |
| Priority date | May 19, 2010 |
| Publication date | Feb 3, 2015 |
| Grant date | Feb 3, 2015 |
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Official abstract text for this publication.
In some embodiments of the invention, a device includes a first semiconductor layer, a second semiconductor layer, a third semiconductor layer, and a semiconductor structure comprising a III-nitride light emitting layer disposed between an n-type region and a p-type region. The second semiconductor layer is disposed between the first semiconductor layer and the third semiconductor layer. The third semiconductor layer is disposed between the second semiconductor layer and the light emitting layer. A difference between the in-plane lattice constant of the first semiconductor layer and the bulk lattice constant of the third semiconductor layer is no more than 1%. A difference between the in-plane lattice constant of the first semiconductor layer and the bulk lattice constant of the second semiconductor layer is at least 1%. The third semiconductor layer is at least partially relaxed.
Opening claim text (preview).
The invention claimed is: 1. A method comprising: growing a first III-nitride semiconductor layer over a growth substrate; growing a second semiconductor layer; growing a third semiconductor layer; and growing a semiconductor structure comprising a III-nitride light emitting layer disposed between an n-type region and a p-type region; wherein the second semiconductor layer is disposed between the first semiconductor layer and the third semiconductor layer; the third semic…
Electricity · mapped topic
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