Epitaxial structure and method for making the same
US-2016380147-A1 · Dec 29, 2016 · US
Fabrication of nitride nanoparticles
US8945964B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8945964-B2 |
| Application number | US-201013145385-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 26, 2010 |
| Priority date | Jan 26, 2009 |
| Publication date | Feb 3, 2015 |
| Grant date | Feb 3, 2015 |
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Abstract
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A method of manufacturing a nitride nanoparticle comprises manufacturing the nitride nanostructure from constituents including: a material containing metal, silicon or boron, a material containing nitrogen, and a capping agent having an electron-accepting group for increasing the quantum yield of the nitride nanostructure. Nitride nanoparticles, for example nitride nanocrystals, having a photoluminescence quantum yield of at least 1%, and up to 20% or greater, may be obtained.
First claim
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The invention claimed is: 1. A method of manufacturing a light-emissive nitride nanoparticle, the method comprising: reacting in a first solvent (i) at least one Group III metal iodide with (ii) at least one Group I metal amide in the presence of (iii) at least one capping agent having an electron-accepting group to produce a nitride crystal, at least two dimensions of the nitride crystal being of a nanoscale dimension, the nitride crystal having the general formula: M 1 x1…
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Electricity · mapped topic
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
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- What does patent US8945964B2 cover?
- A method of manufacturing a nitride nanoparticle comprises manufacturing the nitride nanostructure from constituents including: a material containing metal, silicon or boron, a material containing nitrogen, and a capping agent having an electron-accepting group for increasing the quantum yield of the nitride nanostructure. Nitride nanoparticles, for example nitride nanocrystals, having a photol…
- Who is the assignee on this patent?
- Taylor Peter Neil, Heffernan Jonathan, Sharp Kk
- What technology area does this patent fall under?
- Primary CPC classification C01B21/0632. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Feb 03 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).