Chemically amplified positive resist composition and resist pattern forming process
US-12164231-B2 · Dec 10, 2024 · US
Resist composition and method of forming resist pattern
US8945812B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8945812-B2 |
| Application number | US-201313777046-A |
| Country | US |
| Kind code | B2 |
| Filing date | Feb 26, 2013 |
| Priority date | Feb 29, 2012 |
| Publication date | Feb 3, 2015 |
| Grant date | Feb 3, 2015 |
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Abstract
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A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid, an acid-generator component (B) which generates acid upon exposure and an organic solvent component (S), the organic solvent component (S) containing an organic solvent (S1) including a compound represented by general formula (s-1) shown below and the acid-generator component (B) being an onium salt (in the formula, X represents a single bond or an alkylene group of 1 to 3 carbon atoms; and n represents an integer of 0 to 3).
First claim
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What is claimed is: 1. A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid, an acid-generator component (B) which generates acid upon exposure and an organic solvent component (S), the organic solvent component (S) comprising an organic solvent (S1) comprising a compound represented by general formula (s-1) shown below, and the acid-generator component (B) being an onium salt:…
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Physics · mapped topic
Physics · mapped topic
- G03F7/004Primary
Physics · mapped topic
Physics · mapped topic
Cross-Sectional Technologies · mapped topic
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- What does patent US8945812B2 cover?
- A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid, an acid-generator component (B) which generates acid upon exposure and an organic solvent component (S), the organic solvent component (S) containing an organic solvent (S1) including a compound represented by general formula (s-1) shown below and the acid-generat…
- Who is the assignee on this patent?
- Tokyo Ohka Kogyo Co Ltd
- What technology area does this patent fall under?
- Primary CPC classification G03F7/004. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Feb 03 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).