Patterning device defect detection systems and methods
US-2024210336-A1 · Jun 27, 2024 · US
US8945802B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8945802-B2 |
| Application number | US-65443809-A |
| Country | US |
| Kind code | B2 |
| Filing date | Dec 18, 2009 |
| Priority date | Mar 3, 2009 |
| Publication date | Feb 3, 2015 |
| Grant date | Feb 3, 2015 |
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A method for measuring flare information of a projection optical system includes arranging, on an object plane of the projection optical system, a sectoral pattern surrounded by a first side, a second side which is inclined at a predetermined angle with respect to the first side, and an inner diameter portion and an outer diameter portion which connect both ends of the first side and both ends of the second side; projecting an image of the sectoral pattern via the projection optical system; and determining the flare information based on a light amount of the image of the sectoral pattern and a light amount provided at a position away from the image. With the flare measuring method, it is possible to correctly measure the flare information in an arbitrary angle range of the sectoral pattern.
Opening claim text (preview).
What is claimed is: 1. A flare-measuring method for measuring flare information of a projection optical system, the flare-measuring method comprising: arranging at least one aperture pattern of a mask at an object plane of the projection optical system, each aperture pattern of the at least one aperture pattern having a first straight line portion, a second straight line portion that is inclined at a predetermined angle with respect to the first straight line portion, and a first…
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