Flare-measuring mask, flare-measuring method, and exposure method

US8945802B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-8945802-B2
Application numberUS-65443809-A
CountryUS
Kind codeB2
Filing dateDec 18, 2009
Priority dateMar 3, 2009
Publication dateFeb 3, 2015
Grant dateFeb 3, 2015

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  2. Abstract

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  5. First independent claim

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Abstract

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A method for measuring flare information of a projection optical system includes arranging, on an object plane of the projection optical system, a sectoral pattern surrounded by a first side, a second side which is inclined at a predetermined angle with respect to the first side, and an inner diameter portion and an outer diameter portion which connect both ends of the first side and both ends of the second side; projecting an image of the sectoral pattern via the projection optical system; and determining the flare information based on a light amount of the image of the sectoral pattern and a light amount provided at a position away from the image. With the flare measuring method, it is possible to correctly measure the flare information in an arbitrary angle range of the sectoral pattern.

First claim

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What is claimed is: 1. A flare-measuring method for measuring flare information of a projection optical system, the flare-measuring method comprising: arranging at least one aperture pattern of a mask at an object plane of the projection optical system, each aperture pattern of the at least one aperture pattern having a first straight line portion, a second straight line portion that is inclined at a predetermined angle with respect to the first straight line portion, and a first…

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What does patent US8945802B2 cover?
A method for measuring flare information of a projection optical system includes arranging, on an object plane of the projection optical system, a sectoral pattern surrounded by a first side, a second side which is inclined at a predetermined angle with respect to the first side, and an inner diameter portion and an outer diameter portion which connect both ends of the first side and both ends …
Who is the assignee on this patent?
Shiraishi Masayuki, Nikon Corp
What technology area does this patent fall under?
Primary CPC classification G03F1/84. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Feb 03 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).