Method of processing substrate, method of manufacturing semiconductor device, recording medium, and substrate processing apparatus
US-2024234132-A1 · Jul 11, 2024 · US
US8945707B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8945707-B2 |
| Application number | US-201113582358-A |
| Country | US |
| Kind code | B2 |
| Filing date | Dec 5, 2011 |
| Priority date | May 10, 2011 |
| Publication date | Feb 3, 2015 |
| Grant date | Feb 3, 2015 |
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The surface-coated cutting tool of the present invention is characterized in that a region of 10 μm in a surface of the base material from point a′ to point b′ has two to seven cracks with a width of not more than 200 nm, or two to ten pores are present per length of 10 μm in the surface of the base material from point a′ to point b′, where points a′ and b′ are points defined respectively by lines drawn perpendicularly from points a and b to the surface of the base material where point a is a position located away from an edge ridgeline toward a rake face by distance La and point b is a position located away from the edge ridgeline toward a flank face by distance Lb.
Opening claim text (preview).
The invention claimed is: 1. A surface-coated cutting tool comprising a base material and a coating formed on the base material, said base material having a hard phase and a binder phase binding the hard phases to each other, said coating being formed of a single layer or a plurality of layers, La being less than 0.2 mm and Lb being less than 0.1 mm, where point a is a position located away from an edge ridgeline toward a rake face by a distance of said La and point b is a pos…
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