Methacrylate resin composition and molded article
US-2017313834-A1 · Nov 2, 2017 · US
Poly aryl ether ketone polymer blends
US8945694B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8945694-B2 |
| Application number | US-68774907-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 19, 2007 |
| Priority date | Sep 16, 2005 |
| Publication date | Feb 3, 2015 |
| Grant date | Feb 3, 2015 |
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Abstract
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Filled phase-separated blends of polyaryl ether ketones, polyaryl ketones, polyether ketones, polyether ether ketones and mixtures thereof with at least one polysulfone etherimide, wherein the polysulfone etherimide has greater than or equal to 50 mole % of the polymer linkages contain at least one aryl sulfone group are described. Such filled blends have improved load-bearing capability at high temperature. In another aspect the filled blends have a higher crystallization temperature, especially at fast cooling rates.
First claim
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The invention claimed is: 1. A filled polymer blend comprising a mixture of: from 2 to 99 wt. % of a resin blend comprising: a first resin component comprising one or more polyaryl ether ketones; and a second resin component comprising one or more polysulfone etherimides having greater than or equal to 50 mole % of the polymer linkages containing at least one aryl sulfone group and comprising the reaction product of a dianhydride monomer and a diamine monomer, wherein the ra…
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Cross-Sectional Technologies · mapped topic
Cross-Sectional Technologies · mapped topic
- C08L71/10Primary
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
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- What does patent US8945694B2 cover?
- Filled phase-separated blends of polyaryl ether ketones, polyaryl ketones, polyether ketones, polyether ether ketones and mixtures thereof with at least one polysulfone etherimide, wherein the polysulfone etherimide has greater than or equal to 50 mole % of the polymer linkages contain at least one aryl sulfone group are described. Such filled blends have improved load-bearing capability at hig…
- Who is the assignee on this patent?
- Aneja Ashish, Gallucci Robert Russell, Odle Roy Ray, and 2 more
- What technology area does this patent fall under?
- Primary CPC classification C08L71/10. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Feb 03 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).