Patterned, dense and high-quality SWNTs arrays

Patent metadata

Field	Value
Publication number	US-8945502-B2
Application number	US-42959509-A
Country	US
Kind code	B2
Filing date	Apr 24, 2009
Priority date	Apr 30, 2008
Publication date	Feb 3, 2015
Grant date	Feb 3, 2015

Abstract

An electronics component is disclosed herein. The electronics component include a substrate and a plurality of single-walled carbon nanotubes (SWNTs) formed on said substrate, wherein said plurality of SWNTs form a patterned, dense and high-quality arrays of single-walled carbon nanotubes (SWNTs) on quartz wafers by using FeCl 3 /polymer as catalytic precursors and chemical vapor deposition (CVD) of methane. With the assistance of polymer, the catalysts may be well-patterned on the wafer surface by simple photolithography or polydimethylsiloxane (PDMS) stamp microcontact printing (μCP).

First claim

What is claimed:

1. A method for forming a uniform array of single-walled carbon nanotubes (SWNTs) comprising the steps of:
forming a layer of photoresist on a substrate, the photoresist comprising catalyst particles of FeCl 3 ;
patterning the photoresist into lines on said substrate using photolithography;
treating said substrate with O 2 plasma to remove the lines of photoresist and expose lines of catalytic precursor nanoparticles; and
exposing said substrate to a chemic…

Assignees

• Burke Peter J
• Zhou Weiwei
• Rutherglen Christopher M
• Univ California

Inventors

• Burke Peter J
• Zhou Weiwei
• Rutherglen Christopher M

Classifications

• C01B2202/02

  Chemistry & Metallurgy · mapped topic

• C01B2202/36

  Chemistry & Metallurgy · mapped topic

• B82Y30/00

  Operations & Transport · mapped topic

• C01B2202/08

  Chemistry & Metallurgy · mapped topic

• B82Y10/00 Primary

  Operations & Transport · mapped topic