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Photosensitive resin composition, method for manufacturing structural body, and liquid discharge head
US8944580B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8944580-B2 |
| Application number | US-201113510609-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 31, 2011 |
| Priority date | Feb 5, 2010 |
| Publication date | Feb 3, 2015 |
| Grant date | Feb 3, 2015 |
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- Title
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Abstract
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A photosensitive resin composition includes: a cation polymerizable compound; a photoacid generator having an anion portion represented by the chemical formula 1 and a cation portion, wherein R represents a hydrocarbon group which may be substituted with a fluorine atom and has a total carbon number of 1 to 30; X is selected from the group consisting of a carbon atom and a phosphorous atom; Y is selected from the group consisting of —S(═O) 2 —, —O—CF 2 —, —C(═O)—CF 2 —, —O—C(═O)—CF 2 —, —C(═O)—O—CF 2 —, and a single bond; R has at least one fluorine atom when Y is —S(═O) 2 — or the single bond; m and n are integers selected from the group consisting of m+n=3 and n=0, 1, and 2 when X is the carbon atom; m and n are integers selected from the group consisting of m+n=6 and n=0 to 5 when X is the phosphorous atom; and R and Y may be different from each other when m is equal to or greater than 2; and a salt of an anion portion and a cation portion, wherein an acid strength of an acid derived from the anion portion is equal to or greater than that of hexafluorophosphoric acid and equal to or less than that of hexafluoroantimonic acid.
First claim
Opening claim text (preview).
The invention claimed is: 1. A photosensitive resin composition comprising: a cation polymerizable compound; and a photoacid generator having an anion portion represented by a chemical formula I and a cation represented by a chemical formula 4, wherein R represents a hydrocarbon group which may be substituted with a fluorine atom and has a total carbon number of 1 to…
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Classifications
- G03F7/0045Primary
Physics · mapped topic
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
Physics · mapped topic
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- What does patent US8944580B2 cover?
- A photosensitive resin composition includes: a cation polymerizable compound; a photoacid generator having an anion portion represented by the chemical formula 1 and a cation portion, wherein R represents a hydrocarbon group which may be substituted with a fluorine atom and has a total carbon number of 1 to 30; X is selected from the group consisting of a carbon atom …
- Who is the assignee on this patent?
- Ikegame Ken, Shimomura Masako, Takahashi Hyo, and 1 more
- What technology area does this patent fall under?
- Primary CPC classification G03F7/0045. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Feb 03 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).