Method to reduce surface resistivity of a release agent applicator in a printing apparatus
US-9221244-B2 · Dec 29, 2015 · US
Image forming apparatus and image forming method
US8944556B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8944556-B2 |
| Application number | US-201313970091-A |
| Country | US |
| Kind code | B2 |
| Filing date | Aug 19, 2013 |
| Priority date | Sep 12, 2012 |
| Publication date | Feb 3, 2015 |
| Grant date | Feb 3, 2015 |
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Abstract
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Disclosed is an image forming apparatus including a head configured to discharge an aqueous recording liquid onto a recording medium; and a coating unit configured to apply a process liquid onto the recording medium, wherein the process liquid is formed by emulsifying, by a first surfactant, water including a water-soluble polymer and a low polarity solvent which is not compatible with the water, wherein the water and the low polarity solvent are emulsified as a W/O emulsion in which the water is in a dispersed phase and the low polarity solvent is in a continuous phase.
First claim
Opening claim text (preview).
What is claimed is: 1. An image forming apparatus comprising: a head configured to discharge an aqueous recording liquid onto a recording medium; and a coating unit configured to apply a process liquid onto the recording edit, wherein the process liquid is formed by emulsifying, by a first surfactant, water including a water-soluble polymer and a low polarity solvent which is not compatible with the water, wherein the water and the low polarity solvent are emulsified as a W/O…
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Operations & Transport · mapped topic
- B41J2/0057Primary
Operations & Transport · mapped topic
Operations & Transport · mapped topic
- B41J2/04553Primary
Operations & Transport · mapped topic
Operations & Transport · mapped topic
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Frequently asked questions
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- What does patent US8944556B2 cover?
- Disclosed is an image forming apparatus including a head configured to discharge an aqueous recording liquid onto a recording medium; and a coating unit configured to apply a process liquid onto the recording medium, wherein the process liquid is formed by emulsifying, by a first surfactant, water including a water-soluble polymer and a low polarity solvent which is not compatible with the wate…
- Who is the assignee on this patent?
- Hihara Takeshi, Usui Yuuma, Tsukamoto Takeo, and 10 more
- What technology area does this patent fall under?
- Primary CPC classification B41J2/0057. Mapped technology areas include Operations & Transport.
- When was this patent published?
- Publication date Tue Feb 03 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).