Splashguard for high flow vacuum bubbler vessel

US8944420B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-8944420-B2
Application numberUS-201213350989-A
CountryUS
Kind codeB2
Filing dateJan 16, 2012
Priority dateMar 19, 2009
Publication dateFeb 3, 2015
Grant dateFeb 3, 2015

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present invention is a container having a diptube inlet, at least one baffle disc positioned between the outlet of the diptube and the outlet of the container to provide a narrow annular space between the baffle disc and the sidewall of the container to prevent liquid droplets from entering the outlet to the container and the inner surface of the container sidewall and an annular, radially inward projecting deflector ledge on the sidewall, proximate the baffle disc. The present invention is also a process of delivering a chemical precursor from a container having the above structure. Liquid and vapor delivery are both contemplated.

First claim

Opening claim text (preview).

The invention claimed is: 1. A container having a diptube inlet ending proximate a base of the container; at least one baffle disc, configured as a shallow downwardly open cone, positioned between the outlet of the diptube and an outlet of the container, configured to provide a narrow annular space between the baffle disc and an inner surface of a sidewall of the container; an annular, radially inward projecting deflector ledge on the sidewall, proximate the baffle disc; the baffle disc and deflector ledge capable of minimizing liquid droplets from entering the outlet to the container, a shoulder having an annular radially inward projecting edge spaced axially below the innermost edge of the deflector ledge, and a level sensor which ends near the base of the container capable of having a liquid surface level above the end of the level sensor. 2. The container of claim 1 wherein the deflector ledge has an innermost edge that is radially inward of an outermost edge of the at least one baffle disc. 3. The container of claim 2 wherein the deflector ledge has a shoulder below the innermost edge of the deflector ledge, which shoulder projects radially inward from the container inner surface sidewall, radially short of the innermost edge of the deflector ledge. 4. The container of claim 3 wherein the at least one baffle disc, deflector ledge and shoulder are in the upper portion of the container. 5. The container of claim 1 wherein the deflector ledge is spaced axially between an upper baffle disc and a lower baffle disc. 6. The container of claim 1 wherein the deflector ledge is spaced axially below two baffle discs. 7. The container of claim 1 wherein an inlet to the outlet of the container has an elbow configuration capable of minimizing liquid entering the outlet to the container. 8. The container of claim 1 wherein an inlet to the outlet of the container has a “Tee” configuration capable of minimizing liquid entering the outlet of the container. 9. The container of claim 1 wherein the container has a cylindrical shape. 10. A cylindrical vapor generation container having a diptube inlet capable of delivering a carrier gas into the container; a baffle disc having a circular and concave downward shape, positioned between an outlet end of the diptube inlet and an outlet of the container configured to provide a narrow annular space between an outermost circumferential perimeter edge of the baffle disc and an inner surface of a sidewall of the container; an annular, radially inward projecting deflector ledge on the sidewall, proximate the baffle disc, wherein the deflector ledge has an innermost edge that is radially inward of the outermost circumferential perimeter edge of the baffle disc; capable of minimizing liquid droplets from entering the outlet to the container when the carrier gas is bubbled through a liquid content of the container to dispense the liquid as a vapor from the container, a shoulder having an annular radially inward projecting edge spaced axially below the innermost edge of the deflector ledge, and a level sensor which ends near the base of the container capable of having a liquid surface level above the end of the level sensor. 11. A liquid dispense container having at least one baffle disc, configured as a shallow downwardly open cone, positioned between the inlet end of the diptube outlet and the inlet of the liquid dispense container, configured to provide a narrow annular space between the baffle disc and the inner surface of a sidewall of the container; an annular, radially inward projecting deflector ledge on the sidewall, proximate the baffle disc; wherein the deflector ledge has an innermost edge that is radially inward of an outermost edge of the baffle disc, capable of minimizing liquid droplets from entering the inlet to the liquid dispense container, a shoulder having an annular radially inward projecting edge spaced axially below the innermost edge of the deflector ledge, and a level sensor which ends near the base of the container capable of having a liquid surface level above the end of the level sensor.

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Frequently asked questions

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What does patent US8944420B2 cover?
The present invention is a container having a diptube inlet, at least one baffle disc positioned between the outlet of the diptube and the outlet of the container to provide a narrow annular space between the baffle disc and the sidewall of the container to prevent liquid droplets from entering the outlet to the container and the inner surface of the container sidewall and an annular, radially …
Who is the assignee on this patent?
Birtcher Charles Michael, Steidl Thomas Andrew, Air Prod & Chem
What technology area does this patent fall under?
Primary CPC classification F17C3/00. Mapped technology areas include Mechanical Engineering.
When was this patent published?
Publication date Tue Feb 03 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).